Carl Zeiss Smt Gmbh

Marco Jassmann

Severin Waldis

Caglar Ataman

Markus Hauf

Karl-Eugen Aubele

Wilfried Noell

Klaus Rief

Benedikt Knauf

Jian Deng

Sebastian Lani

Roger Marc Bostock

Yves Petremend

Lothar Kulzer

Sven Ulmer

An optical component comprising a mirror array having a multiplicity of mirror elements, which each have at least one degree of freedom of displacement, and which are each connected to at least one actuator for displacement, has a multiplicity of local regulating devices for damping oscillations of the mirror elements, wherein each of the regulating devices in each case has at least one capacitive sensor having at least one moveable electrode and at least one electrode arranged rigidly relative to the carrying structure.

Optical component

An optical module includes a chamber capable of being evacuated and a mirror in the chamber. The mirror includes a plurality of individual mirrors. Each individual mirror includes: a mirror body including a reflection face; a support structure; and a thermally conductive portion that mechanically connects the support structure to the mirror body. For at least one individual mirror, the thermally conductive portion includes a plurality of thermally conductive strips arranged radially, adjacent thermally conductive strips being separated from each other, and each of the plurality of thermally conductive strips connecting the mirror body to the support structure. For at least one individual mirror, an actuator is associated with the mirror body, the actuator being configured to displace the mirror body relative to the support structure in at least one degree of freedom.

Optical module for guiding a radiation beam

A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.

Method for moving an optical element of a projection exposure apparatus for microlithography

Growing community of inventors

Neresheim-Dorfmerkingen, Germany

Marco Jassmann