Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Marco Hendrikus Hermanus Oude Nijhuis

Hans Butler

Marc Wilhelmus Maria Van Der Wijst

Johan Hendrik Geerke

Joost De Pee

Clementius Andreas Johannes Beijers

Francois Xavier Debiesme

Erik Roelof Loopstra

Bernhard Geuppert

Yim Bun Patrick Kwan

Dick Antonius Hendrikus Laro

Rodolfo Guglielmi Rabe

Youssef Karel Maria De Vos

Peter Paul Hempenius

Robertus Mathijs Gerardus Rijs

Olav Johannes Seijger

Alexander Petrus Josephus Van Lankvelt

Nicolaas Bernardus Roozen

Erwin Antonius Henricus Fransiscus Van Den Boogaert

Ingmar August Kerp

Richardus Simon Antonius Oostveen

Alexander Maurice Steenhoek

The invention relates to a vibration isolation system (VIS) comprising: &#x2014;a base (); &#x2014;a coupling element () to be coupled to a vibration sensitive object; &#x2014;a vibration isolator (-) arranged between the base and the coupling element; &#x2014;a bellows () to be arranged between the VIS coupling element or the vibration isolator and a protective housing () surrounding the vibration sensitive object; and &#x2014;one or more separate damping elements to act on convolutions of the bellows.

Vibration isolation system and lithographic apparatus

Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).

Lithographic apparatus and device manufacturing method

A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate. The lithographic apparatus includes an acoustical sensor to measure a first acoustic vibration in a sensor measurement area in the lithographic apparatus. An actuator is provided to generate a second acoustic vibration in at least an area of the lithographic apparatus. Further, a control device is provided having a sensor input to receive a sensor signal of the acoustical sensor and an actuator output to provide an actuator drive signal to the actuator. The control device is arranged to drive the actuator so as to let the second acoustic vibration at least partly compensate in the area the first acoustic vibration.

Lithographic apparatus with actuator to compensate acoustic vibration

A lithographic apparatus includes a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.

Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method

A vibration damping arrangement for a lithographic apparatus includes a sensor arranged to, in use, detect a vibration of a projection system. An actuator is arranged to, in use, exert a force on a control unit of the projection system to convert an output signal of the sensor to an actuator input signal such that, during operation, the vibration of the projection system is mitigated by controlling the actuator by the input signal to exert the force to the projection system.

A lithographic apparatus may be provided with an acoustic resonator to dampen an acoustic vibration in the lithographic apparatus. The acoustic resonator may include a Helmholtz resonator. The helmholz resonator may be provided with an active element to provide active damping and/or altering a spring characteristic of the mass spring assembly formed by the resonator. The resonator may be provided at a slit in a shield between the patterning device stage and the projection system to suppress transfer of acoustical vibrations, caused by e.g. a movement of the patterning device stage, to the projection system.

Lithographic apparatus having acoustic resonator

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Eindhoven, Netherlands

Marco Hendrikus Hermanus Oude Nijhuis