Centre National De La Recherche Scientifique

Sorbonne Université

Université´ D'aix-Marseille

Université Paris-Saclay

Universite Paris Cité

Marco Faustini

Deborah Jones

Cédric Boissiere

Marion Giraud

David Grosso

Thomas Bottein

Cédric Tard

Andréa Cattoni

Jennifer Peron

Olivier Dalstein

The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol-gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.

Nanoimprint lithography process and patterned substrate obtainable therefrom

The invention relates to a porous material in the form of microspheres based on iridium and/or iridium oxide, its preparation process, its use as anodic catalyst in a water electrolyser based on a solid polymer electrolyte, also called PEM water electrolyser (with PEM meaning 'Proton Exchange Membrane' or 'Polymer Electrolyte Membrane') or for the manufacture of light-emitting diodes for various electronic devices or for cars, and a PEM water electrolyser comprising such a material as an anode catalyst.

Iridium and / or iridium oxide microsphere-based porous material, preparation method therefor, and uses thereof

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Paris, France

Marco Faustini