Koninklijke Philips Corporation N.V.

Asml Netherlands B.v.

Marco Baragona

Babu Varghese

Jonathan Alambra Palero

Martin Jurna

Sergei Shulepov

Margaret Ruth Horton

Wouter Hendrik Cornelis Spoorendonk

Alfonso Agatino Isola

Bart Gottenbos

Mark Thomas Johnson

Johan Lub

Ronald Van Der Ham

Yu-Wen Chang

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Michel Riepen

Cornelis Petrus Hendriks

Erik Henricus Egidius Catharina Eummelen

Albertus Cornelis Den Brinker

Johannes Hendrikus Maria Spruit

Koen Steffens

Frank Johannes Jacobus Van Boxtel

Yannyk Parulian Julian Bourquin

Okke Ouweltjes

Eduard Gerard Marie Pelssers

Lutz Christian Gerhardt

Roland Alexander Van De Molengraaf

Kiran Hamilton J Dellimore

Guillaume Leopold Theodorus Frederik Hautvast

Valentina Lavezzo

David Bessems

Willem Verkruijsse

Gerben Pieterse

Nico Maris Adriaan De Wild

Johannes Christiaan Maria Jasper

Richard Moerman

Denny Mathew

Daniel Jozef Maria Direcks

Marinus Johannes Maria Van Dam

Christoph Neukirchen

Jacek Lukasz Kustra

Pieter Mulder

Clemens Johannes Gerardus Van Den Dungen

Peter Bingley

Oedilius Johannes Bisschop

Aaldert Jan Elevelt

Hendrik Halling Van Amerongen

Milica Kovacevic Milivojevic

Walter Hermans

Ralph Theodorus Hubertus Maessen

Tim Tielemans

Milica Kovacevic-Milivojevic

Jacob Marinus Jan Den Toonder

Marinus Arnoldus Martinus Vugts

Jan Willem Cromwijk

Marinus Karel Johannes De Jager

Maikel Adrianus Cornelis Schepers

Nikolaj Vasiljevitsj Zjiroecha

Pascal De Graaf

Alessandra Di Tullio

Roland Cornelis Martinus Vulders

Johanna Antoinette Maria Sondag-Huethorst

Robertus Leonardus Maria In 't Groen

David Halter

Debbie Rem-Bronneberg

Pieter Debrauwer

Antonius Arnoldus Henricus Van Der Steen

Zoi Tokoutsi

Quintin Oliver Williams

Sandra Hotzl

Karen Veroy-grepl

Martin Grepl

Johannes Dirk Wierstra

Boamfa Marius Iosif Boamfa

Arend Hinderikus Bakker

Harold Johannes Antonius Brans

Ralph Timotheus Huijgen

Guido Antonius Theodorus Adriaensen

Sandra Hoetzl

Anna Ezerskaia

Robby Petrus Cornelis Van Dreumel

Anna Ezerskaya

Katia Donato

Karen Veroy-Grepl

Sandra HÖTZL

Walter Hermans Hermans

Samer Bou Jawde

Alexander Haak

Priscilla BRANDÃO Silva

Bruno Jean François Frackowiak

The invention relates to a system for assisting in planning a focal therapy treatment of a structure () within a patient body () by applying a treatment quantity using one or more devices () operated in one or more device positions. The system comprises a unit () configured to generate a constraint function representing clinical objectives relating to the treatment quantity, a selection unit () configured to determine, for each of at least some non-selected candidate device positions, a sum of negative derivatives of the constraint function with respect to the treatment parameter associated with the respective device position and to select a device position for use in the treatment based on a comparison of the determined sums, and an optimization unit () configured to determine at least one optimized treatment parameter for the selected device position based on the constraint function.

Treatment planning for focal therapy treatments

The invention relates to a planning apparatus () for determining an ablation probe parameter. A thermal energy determination unit determines, in a first part of a planning procedure, a first thermal energy distribution by using a thermal energy function like a Bioheat equation such that a temperature-based condition is fulfilled, which is indicative of a desired treatment outcome for a subject (). An ablation probe parameter determination unit determines, in a second part, the ablation probe parameter by using a second thermal energy function, which relates a second thermal energy distribution to be caused by the ablation probe () to b) the ablation probe parameter, such that a deviation between the first thermal energy distribution and the second thermal energy distribution fulfils a predefined deviation criterion. This dissection into two parts allows for an improved adaptability of the determination of the ablation probe parameter to different types of ablation procedures.

Planning apparatus for determining an ablation probe parameter for a single ablation probe or for multiple ablation probes

Disclosed herein is a medical system () comprising a processor (). Execution of the machine executable () instructions causes a processor () to: receive () three-dimensional medical image data () descriptive of a subject (); receive () a desired ablation volume (), wherein the desired ablation volume is registered to the three-dimensional medical image data; receive () one or more protected volumes (); generate () a discrete set of ablation probe positions (); receive () a discrete set of ablation patterns (); initialize () a composite ablation binary mask (); and initialize () a sequential ablation probe configuration list (). Execution of the machine executable instructions further causes the processor to iteratively generate the sequential ablation probe configuration list by repeatedly: determining () an unablated volume () by comparing the composite ablation binary mask to the desired ablation volume; determining () a chosen ablation probe configuration () using a chosen objective function () dependent upon the one or more protected volumes, the unablated volume, the discrete set of ablation patterns, and the discrete set of ablation probe positions; update () the composite ablation binary mask by calculating a union between the composite ablation binary mask and the one of the discrete set of ablation patterns located at the one of the discrete set of ablation probe positions; and add () the chosen ablation probe configuration to the sequential ablation probe configuration list.

Determining ablation probe configuration

A method () of estimating one or more physiological parameters, in particular of a cardiac region, based on medical imaging data. An input time series of three-dimensional medical images is received (), representative of a cardiac region of a patient. A meshless simulation frame-work is applied () for simulating blood flow through at least a portion of the anatomical area captured by the images. The simulation framework comprises in particular simulating force interactions between individual elements of a simulated fluid (representing blood) and individual patches of a tissue structure of the imaged cardiac region. One or more physiological parameters () are derived based on the simulated blood flow.

Method of estimation physiological parameters using medical image data

A shaving unit and/or electric shaver having a lighting module for providing an optical heating function at a skin-contacting surface of the shaving unit is disclosed. An encapsulation arrangement for components of the lighting module using a potting material is described. The potting material encapsulates, on both an upper and lower side, a carrier to one or more lighting elements are mounted.

Shaving unit, electric shaver having the shaving unit, and associated method

A device for RF skin treatment includes an outer electrode arranged on an operational side of the device. The outer electrode has an annular or equilateral polygonal shape. An inner electrode is arranged at a center of the outer electrode and is surrounded by the outer electrode. An RF generator is arranged to supply an RF treatment voltage between the inner electrode and the outer electrode. A skin contact surface of the inner electrode has a largest cross-sectional dimension in a range of 200-500 &#x3bc;m, and the RF treatment voltage is less than 50 V.

Centrosymmetric radio frequency electrode configuration for skin treatment

A hair care device () comprises a heat source () for heating hair up till a first temperature that is no more than 150&#xb0; C. (and thus lower than a critical temperature at which hair cuticle damage will occur), and a radiation source () for&#x2014;in combination with heat from the heat source ()&#x2014;selectively heating a hair cortex to a second temperature exceeding the first temperature and sufficiently high for hair styling.

Hair care device

There is provided a system () and method for determining a water or lipid level of skin. The system () comprises at least two electrodes () suitable for contacting skin, and a signal generator () configured to generate an electrical signal at a frequency across the at least two electrodes (). The system () is configured to measure a conductivity between the at least two electrodes (). The system () is further configured to determine a water or lipid level of skin based on the measured conductivity and the frequency of the electrical signal.

Determining a water and a lipid level of skin

There is provided a system () and method for determining a water or lipid level of skin. The system () comprises at least two electrodes () suitable for contacting skin, and a signal generator () configured to generate an electrical signal at a frequency across the at least two electrodes (). The system () is configured to measure a permittivity between the at least two electrodes (). The system () is further configured to determine a water or lipid level of skin based on the measured permittivity and the frequency of the electrical signal.

Determining a water or lipid level of skin

A device for radio frequency (RF) skin treatment of skin of a user is provided. The device comprises an active electrode and a return electrode. The device further comprises an RF generator arranged to supply RF energy to the user's skin via the active electrode and the return electrode. The return electrode has a planar skin contact surface extending in a main plane. The active electrode has a skin contact surface with a maximum dimension in a range from 100 &#x3bc;m to 500 &#x3bc;m, and a surface area of the planar skin contact surface of the return electrode is at least 5 times larger than a surface area of the skin contact surface of the active electrode. The skin contact surface of the active electrode is arranged in a position at a distance from the main plane, seen in a direction perpendicular to the main plane. The device may be advantageously used, for example, to control the dimensions and shape of a thermal lesion in the user's skin generated by the RF energy.

Radio frequency skin treatment

A device for (RF) skin treatment comprising an active electrode having a first skin contact surface for electrical contact with a skin of a user and during use A return electrode having a second skin contact surface for electrical contact with the skin of the user during use. An RF generator to supply an RF treatment voltage between the active electrode and the return electrode to heat the skin below the active electrode. A coupling member arranged on the first skin contact surface comprising an electrically conductive material to improve the electrical coupling of the active electrode to the skin surface. The coupling member comprising a first layer of a first electrically conductive material arranged on the first skin contact surface, and a second layer of a second electrically conductive material, arranged on a side of the first layer remote from the first skin contact surface.

Device for radio-frequency skin treatment

The invention relates to a skin treatment device () for fractional treatment of the skin () of a human being. A radiation source () emits a multi-mode laser beam () with a superposition () of mutually different higher-order laser modes. The multi-mode laser beam is configured by said superposition of different laser modes to simultaneously cause a first plurality of high-intensity zones, where the thermal threshold (TC) for collagen denaturation for the treatment zone () of the skin is at least reached, and a second plurality of low-intensity zones where the thermal threshold (TF) for fibroblast stimulation for the treatment zone of the skin is at least reached. This is advantageous for obtaining a skin treatment device with a simple and therefore low-cost fractional laser skin treatment system for combined collagen denaturation and fibroblast stimulation. The skin treatment device is based on non-uniform laser radiation in the form of the multi-mode laser beam.

Skin treatment device

The invention provides a non-invasive skin treatment device () comprising an r.f. treatment electrode (); a return electrode (); an r.f. generator () configured and arranged such that, during treatment, an r.f. treatment signal is applied between the r.f. treatment electrode () and the return electrode () for heating an inner region () of skin; an impedance measurement circuit () configured and arranged to measure, before treatment of the inner region, an initial skin impedance (Z) between the r.f. treatment electrode () and the return electrode (); and a treatment settings determiner () configured and arranged to determine, before treatment of the inner region (), treatment settings associated with the r.f. treatment signal depending on the initial skin impedance (Z) and on a dimension of the r.f. treatment electrode () in the contact plane, the treatment settings comprising at least one of a treatment duration (T) associated with a desired treatment result, and an r.f. electrical parameter associated with the r.f. treatment signal. The skin treatment device () further comprises a controller () configured and arranged to consecutively activate the impedance measurement circuit () and the treatment settings determiner () before treatment of the inner region (), configure the r.f. generator () to provide the r.f. treatment signal according to the treatment settings, and activate the r.f. generator () to apply the r.f. treatment signal to the inner region () for the treatment duration (T). The invention is based on the insight obtained from multiple measurements made during the creation of microscopic thermal lesions in an inner region of skin by applying r.f. measurement and treatment signals. By analyzing the histological and heating results, a relationship was obtained between the initial impedance (Z), the dimension of the r.f. treatment electrode (), and the treatment settings required to obtain a particular skin treatment result. This relationship has been found to be relatively constant for different subjects, different treatment locations on the body and different skin moisture contents. The invention makes it possible to preset or predetermine, i.e. in advance, the treatment duration (T) and/or the r.f. electrical parameters associated with the r.f. treatment signal accurately enough to avoid undesired skin damage during the treatment. The device can be simpler, as it is no longer essential to continuously monitor the impedance during treatment to determine the onset of undesired skin damage, such as ablation, which is the safety feature known from conventional devices.

Non-invasive skin treatment device using r.f. electrical current with a treatment settings determiner

A oral irrigator device () for cleaning teeth, including a system () for producing a stream of liquid/air bursts and a nozzle () connected to the system, and through which the stream of liquid/air bursts are directed. The nozzle can include a guidance tip () including a base portion (), a tip portion (), and an orifice () through which the stream of liquid/air bursts exits at a flow output pattern, and a flow output pattern selection mechanism (') connected to or positioned within the guidance tip. A flow output pattern selection mechanism can be configured to be selectively actuated and to vary, upon the actuation the flow output pattern between a first flow output pattern to at least a second flow output pattern.

Adjustable assembly and nozzle for providing various liquid/air output flow patterns

The invention relates to a device () for RF skin treatment, comprising an active electrode () arranged on an operational side () of the device and having a first skin contact surface for contact with a skin of a user, which first skin contact surface has a largest cross-sectional dimension smaller than or equal to 2 mm. The device comprises a return electrode () arranged on the operational side () of the device and having a second skin contact surface for contact with the skin of the user, wherein an area of the second skin contact surface is at least five times larger than an area of the first skin contact surface. An RF generator () is arranged to supply an RF treatment voltage between the active electrode () and the return electrode () so as to heat a skin region below the active electrode, wherein the RF treatment voltage has a frequency in a range of 100 MHz-3 GHz. By using a frequency of the RF treatment voltage in said range, a depth of thermal lesions voltage is considerably increased as compared to RF skin treatment devices using a comparable RF treatment voltage, but at a much lower frequency.

Device for radio frequency skin treatment

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Delft, Netherlands

Marco Baragona