Basf Se Corporation

Marco Arnold

Alexander Fluegel

Dieter Mayer

Charlotte Emnet

Cornelia Roeger-Goepfert

Marcel Patrik Kienle

Nadine Engelhardt

Roman Benedikt Raether

Alexandra Haag

Lucas Benjamin Henderson

Guenter Scherr

Katharina Fritzsche

Michael Siemer

Jean-Pierre Berkan Lindner

Miran Yu

Doris Kremzow-Graw

Nicole Meier

Shih Ming Lin

Madhura Shreekar Pawar

Sathana Kitayaporn

Chieh Chu

Shih Wei Chou

Cheng Chen Kuo

Tzu Tsang Huang

Chiao Chien Wei

Harald Hoerhammer

Cornelia Röger-Göpfert

Harald HÖRHAMMER

Alexander FLÜGEL

The present invention relates to a resin composition, comprising (a) an epoxy resin; (b) a curing agent comprising the structure of formula C1; (c) an inorganic filler; wherein Ris (a) a siloxane group of formula C1a or (b) or both a siloxane group of formula C1a and an ester group of formula C1b; Ris selected from a bulky Cto Calkyl group comprising at least one tertiary or quaternary carbon atom; R, R, Rare independently selected from methyl, ethyl and 1-propyl; Ris selected from a linear or branched Cto Calkyl; Xis selected from a divalent Cto Calkanediyl group; and n is an average number of repeating units and is from 1.05 to 200.

Epoxy resin composition

Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1[A-B-A'-Z][Y—Z]  (L1)whereB is a diacid fragment of formula L2 A, A' are amine fragments independently selected from the group consisting of formula L3a Y is a co-monomer fragment;Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; andm is 0 or an integer of from 1 to 400.

Composition for copper bump electrodeposition comprising a polyaminoamide type leveling agent

Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

Composition for cobalt plating comprising additive for void-free submicron feature filling

An aqueous composition comprising (a) metal ions comprising tin ions and silver ions and (b) at least one complexing agent of formula (C1) R—X—S—X[D-X—]—S—X—R, (C2) R—X—S—X-D-[X—S—]X—R, (C3) R—X—S—X-[D-X—]S—X—Rwherein X, Xare independently selected from a linear or branched C-Calkanediyl, which may be unsubstituted or substituted by OH; X, Xare independently selected from X, which may be further substituted by —X—COOR, —X—SO—O—R, a Cto Cpolyoxyalkylene group of formula —(O—CH—CHR)—OH, or a combination thereof, and —X—NH—CO—X—CO—NH—X—; X, Xare independently selected from a chemical bond and X; X, Xare independently selected from X; Xis a linear or branched Ci to C10 alkyl; Xis selected from Xand a divalent 5 or 6 membered aromatic group; R, Rare independently selected from a monovalent 5 or 6 membered aromatic N-heterocyclic group comprising one N atom or two N atoms which are separated by at least one C atom, and its derivatives received by N-alkylation with a C-C-alkyl group, which may be substituted by —COORor —SO—O—R, and which aromatic N-heterocyclic group may optionally further comprise, under the proviso that X21 is substituted by at least one OH, one S atom; R, Rare independently selected from a monovalent 5 or 6 membered aliphatic N-heterocyclic group comprising one N atom and one O atom; Dis independently selected from S, O and NR; Dis (a) a divalent 5 or 6 membered aliphatic heterocyclic ring system comprising 1 or 2 S atoms, or (b) a 5 or 6 membered aromatic heterocyclic ring system comprising at least two N atoms and optionally one or two S atoms; Dis independently selected from S and NR; n is an integer of from 0 to 5; z is an integer from 1 to 50; Ris selected from H and a linear or branched C-Calkyl; Ris selected from H and a linear or branched Cto Calkyl; and Ris selected from R10 and a cation.

Composition for tin-silver alloy electroplating comprising a complexing agent

The invention relates to a polyamine-based or polyhydric alcohol-based suppressing agent. The suppressing agent is modified by reaction with a compound that introduces a branching group into the suppressing agent before they are reacted with an alkylene oxide. The suppressing agent shows extraordinary superfilling properties, particularly when used to fill in features having extremely small aperture sizes and/or high aspect ratios.

Composition for metal plating comprising suppressing agent for void free filing

Described herein is an aqueous composition including tin ions and at least one compound of formula I

Composition for tin or tin alloy electroplating comprising suppressing agent

A cobalt electroplating composition may include (a) cobalt ions; and (b) an ammonium compound of formula (NRRRH)X, wherein R, R, Rare independently H or linear or branched Cto Calkyl, X is one or more n valent inorganic or organic counter ion(s), and n is an integer from 1, 2, or 3.

Composition for cobalt or cobalt alloy electroplating

The present invention relates to the use of an aqueous composition comprising tin ions optionally further alloy metal ions selected from silver, copper, indium, and bismuth ions and at least one additive comprising a linear or branched polyimidazolium compound comprising the structural unit of formula (L1) for depositing tin or tin alloy containing layers and a process for depositing tin alloy layer onto a substrate. 

Composition for tin or tin alloy electroplating comprising leveling agent

A method of detecting space debris includes: generating a virtual space debris in accordance with the law of conservation of mass by applying a debris breakup model to an object of breakup origin; calculating an orbit of each virtual space debris based on a debris orbit propagation model; and generating appearance frequency distribution of a motion vector of each virtual space debris on the celestial sphere based on the orbit calculation. The above operations are executed multiple times. The method further includes setting a search range vector based on a motion vector having a high level of the appearance frequency distribution of the motion vector, and applying a stacking method to regions in images captured at time intervals during the fixed point observation, the regions being shifted along the search range vector sequentially in the order of capture, thereby detecting space debris appearing on the images.

Composition for metal electroplating comprising leveling agent

Described herein is an aqueous composition including tin ions and at least one compound of formula I where

A composition for metal plating comprising a source of metal ions and at least one leveling agent comprising at least one polyaminoamide comprising a polymer fragment of formula (I) or derivatives thereof obtainable by complete or partial protonation or N-quarternisation. 

A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X&#x2014;CO&#x2014;O&#x2014;R, X&#x2014;SO&#x2014;O&#x2014;R, X&#x2014;PO(OR), X&#x2014;SO&#x2014;O&#x2014;Rfunctional groups, wherein Xis a divalent group selected from (i) a chemical bond (ii) aryl, (iii) Cto Calkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group &#x2014;X&#x2014;X&#x2014;, (v) an alkylaryl group &#x2014;X&#x2014;X&#x2014;, and (vi) &#x2014;(O&#x2014;CHR)O&#x2014;, Ris selected from H and Cto Calkyl. Ris selected from H and Cto Calkyl, Xis a divalent aryl group, Xis a divalent Cto Calkandiyl group.

Composition for cobalt electroplating comprising leveling agent

The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein Xis selected from a linear or branched C-Calkanediyl, which may optionally be interrupted by O or S or a Cto Caromatic moiety, Ris a copolymer of ethylene oxide and a further Cto Calkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, Ris selected from H, R, R, R, R, are (a) independently selected from H, R, R, or (b) may together form a divalent group X; Xis selected from a linear or branched C-Calkanediyl, which may optionally be interrupted by O, S or NR; Ris H or a linear or branched C-Calkyl, Ris selected from H, Rand a linear or branched C-Calkyl. 

A composition comprising a source of metal ions and at least one additive comprising a polyalkyleneimine backbone, said polyalkyleneimine backbone having a molecular weight Mw of from 300 g/mol to 1000000 g/mol, wherein the N hydrogen atoms in the backbone are substituted by a polyoxyalkylene radical and wherein the average number of oxyalkylene units in said polyoxyalkylene radical is from 1.5 to 10 per N&#x2014;H unit.

A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant,wherein

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Heidelberg, Germany

Marco Arnold