Asml Netherlands B.v.

Marcio Alexandre Cano Miranda

Ivo Adam Johannes Thomas

Gheorghe Tanasa

Siebe Landheer

Franciscus Johannes Joseph Janssen

Arnout Johannes Meester

Hans Jansen

Johannes Henricus Wilhelmus Jacobs

Koen Steffens

Paulus Martinus Maria Liebregts

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Han Henricus Aldegonda Lempens

Paul Petrus Joannes Berkvens

Jeroen Peter Johannes Bruijstens

Patrick Johannes Wilhelmus Spruytenburg

Christophe De Metsenaere

Joris Johan Anne-Marie Verstraete

Richard Joseph Bruls

Bauke Jansen

Gerardus Adrianus Antonius Maria Kusters

Hrishikesh Patel

Gert-Jan Gerardus Johannes Thomas Brands

Mathieus Anna Karel Van Lierop

Christiaan Alexander Hoogendam

Michel Riepen

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Daniel Jozef Maria Direcks

Laurentius Catrinus Jorritsma

Eva Mondt

Maurice Martinus Johannes Van Der Lee

Lambertus Dominicus Noordam

Peng Feng

Jan Bernard Plechelmus Van Schoot

Han-Kwang Nienhuys

Ruud Hendrikus Martinus Johannes Bloks

Leon Martin Levasier

Yuri Johannes Gabriël Van De Vijver

Danny Maria Hubertus Philips

Martinus Agnes Willem Cuijpers

Manish Ranjan

Roger Wilhelmus Antonius Henricus Schmitz

Oleg Voznyi

Alain Louis Claude Leroux

Albert Pieter Rijpma

Daniël Jozef Maria Direcks

Kursat Bal

Oleksiy Galaktionov

Ruud Hendricus Martinus Johannes Bloks

Nicolaas Ten Kate

Roelof Frederik De Graaf

Marcel Beckers

Laurentius Johannes Adrianus Van Bokhoven

Paul William Scholtes-Van Eijk

Matheus Anna Karel Van Lierop

Yücel Kök

Gert-Jan Geradus Johannes Thomas Brands

An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.

Lithographic apparatus and a device manufacturing method

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

Lithographic apparatus and a device manufacturing method involving thermal conditioning of a table

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

Lithographic apparatus and method of operating the apparatus

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

Lithographic apparatus and method of operating the apparatus with a humid gas space between a projection system and a liquid confinement structure

An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

Growing community of inventors

Eindhoven, Netherlands

Marcio Alexandre Cano Miranda