Carl Zeiss Microscopy Gmbh

Politechnika Lodzka

Marcin Janaszewski

Josef Biberger

Ralph Pulwey

Lorenz Lechner

Rainer Arnold

Michal Postolski

Wlodzimierz Mosorow

Krzysztof Grudzien

Radoslaw Wajman

Zbigniew Chaniecki

Erling Hammer

Laurent Babout

Dominik Sankowski

Jacek Nowakowski

Robert Banasiak

Andrzej Romanowski

A particle microscope includes a particle beam system directing a particle beam onto a sample. The particle beam system includes a magnetic lens energized by an adjustable lens current. The sample is positioned at an adjustable distance from the lens, and particles of the beam have an adjustable kinetic energy. A method of operating such microscope includes positioning a sample at a distance from the lens, adjusting the kinetic energy, changing the lens current at plural different lens current change rates, determining a lens current at focus for each of the plural different lens current change rates, and determining an optimized lens current based on the determined lens currents at focus and the lens current change rates.

Methods of operating particle microscopes and particle microscopes

The application relates to a method for analyzing, in particular for imaging, and/or processing of an object as well as a particle beam device for carrying out this method. In particular, the particle beam device of this application is an electron beam device and/or an ion beam device. The method in particular comprises the control unit providing a first control parameter, wherein a beam guiding unit is controlled using the first control parameter for guiding the particle beam and/or wherein a moving unit is controlled using the first control parameter for moving an object holder, correlating a position of the object holder in a second coordinate system to the object position on the surface of the object, identifying a first coordinate transformation between the first coordinate system and the second coordinate system, identifying an orientation position of a distinctive feature on the surface of the object and identifying first coordinates of the orientation position in the first coordinate system, the control unit providing a second control parameter, wherein the second control parameter is used for at least one of: controlling the beam guiding unit for guiding the particle beam, controlling the moving unit for moving the object holder or controlling a detector, identifying again the orientation position of the distinctive feature and identifying second coordinates of the orientation position in the first coordinate system, comparing the first coordinates with the second coordinates, identifying a local displacement of the first coordinates to the second coordinates, identifying a second coordinate transformation using the first coordinate transformation and the local displacement and identifying a position of an area to be analyzed and/or processed on the surface of the object.

Method for analyzing and/or processing an object as well as a particle beam device for carrying out the method

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Pabianice, Poland

Marcin Janaszewski