Stmicroelectronics S.r.l.

Marcello Mariani

Lorena Beghin

A method for manufacturing circuit structures integrated in a semiconductor substrate that includes regions, in particular isolation regions, includes the steps of:&#x2014;depositing a conductive layer to be patterned onto the semiconductor substrate;&#x2014;forming a first mask of a first material on the conductive layer;&#x2014;forming a second mask made of a second material that is different from the first and provided with first openings of a first size having spacers formed on their sidewalls to uncover portions of the first mask having a second width which is smaller than the first;&#x2014;partly etching away the conductive layer through the first and second masks such to leave grooves of the second width;&#x2014;removing the second mask and the spacers; and&#x2014;etching the grooves through the first mask to uncover the regions provided in the substrate and form conductive lines.

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Carnate, Italy

Marcello Mariani