Infineon Technologies Ag

Semiconductor 300 Gmbh & Co. Kg

Marcel Tognetti

The invention relates to a method for generating ultrapure steam by oxidation of hydrogen in a closed torch with separate feed lines for hydrogen and oxygen and a discharge line for discharging the steam which is formed to a process chamber. The invention also relates to an arrangement for carrying out the method. The invention is intended to provide a method which is simple to implement and an arrangement for generating ultrapure steam which results in a significantly extended injector service life. For this purpose, oxygen and water are fed to the torch in a slightly superstoichiometric ratio, and pure additional oxygen is admixed with the steam formed during the combustion, when it enters the process chamber, in order to generate a considerable excess of oxygen in the steam. The associated device comprises a torch with feed lines for feeding hydrogen and oxygen to the closed torch and a discharge line leading to a process chamber. Each feed line being assigned a mass flow controller. The discharge line leading to a process chamber is connected to an additional oxygen feed line, which is also provided with a mass flow controller.

Method and arrangement for generating ultrapure steam

There is described a reactor for manufacturing a semiconductor device. The reactor includes a container for enclosing a gas and has an aperture and a surface ambient to the aperture. A seal for sealing the aperture of the container with a surface is pressed against the surface of the container. Portions of the surface of the container and corresponding portions of the surface of the seal form a combination of a beveled peak and groove surrounding the aperture. Therefore, with improved sealing a pressure variation of the gas within the container caused by a pressure variation in the ambient environment is reduced.

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Dresden, Germany

Marcel Tognetti