Asml Netherlands B.v.

Marcel Koenraad Marie Baggen

Peter Paul Hempenius

Henricus Martinus Johannes Van De Groes

Dirk-Jan Bijvoet

Niels Johannes Maria Bosch

Sven Antoin Johan Hol

Maarten Frans Janus Kremers

Arjan Martin Van Der Wel

Sjoerd Nicolaas Lambertus Donders

Hans Butler

Engelbertus Antonius Fransiscus Van Der Pasch

Andre Bernardus Jeunink

Marc Wilhelmus Maria Van Der Wijst

Johannes Hubertus Antonius Van De Rijdt

Fransiscus Mathijs Jacobs

Albert Johannes Maria Jansen

Raymond Laurentius Johannes Schrijver

Robertus Jacobus Theodorus Van Kempen

Erik Roelof Loopstra

Johannes Jacobus Matheus Baselmans

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Johannes Petrus Martinus Bernardus Vermeulen

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Harmen Klaas Van Der Schoot

Theodorus Petrus Maria Cadee

Richard Joseph Bruls

Jan Van Eijk

Tjarko Adriaan Rudolf Van Empel

Jan Steven Christiaan Westerlaken

Tammo Uitterdijk

Stoyan Nihtianov

Robert-Han Munnig Schmidt

Tom Van Zutphen

Johannes Christiaan Maria Jasper

Jeroen Pieter Starreveld

Jan Frederik Hoogkamp

Youssef Karel Maria De Vos

Mark Constant Johannes Baggen

Frank Auer

Stefan Geerte Kruijswijk

Wouter Onno Pril

Christiaan Louis Valentin

Willem Richard Pongers

Jeroen Arnoldus Leonardus Johannes Raaymakers

Krijn Frederik Bustraan

Thomas Josephus Maria Castenmiller

Maarten Hartger Kimman

Frank Pieter Albert Van Den Berkmortel

Arjan Franklin Bakker

Michael Johannes Vervoordeldonk

Martinus Cornelis Reijnen

Jan-Jaap Kuit

Fransicus Mathijs Jacobs

Remko Wakker

Patrick David Vogelsang

Peter Schaap

Antonius Henricus Arends

Michael Johannes Christiaan Ronde

Lucas Kuindersma

Kuo-Feng Tseng

Joep Janssen

Hubrecht Bastiaan Jasperse

Thomas Jan De Hoog

Sinar Juliana

Olaf Hubertus Wilhelmus Van Bruggen

Johannes Roland Dassel

An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

Substrate positioning device and electron beam inspection tool

A stage apparatus for an e-beam inspection apparatus comprising: an object table () comprising an supporting surface, the object table configured to support a substrate () on the supporting surface; a positioning device () configured to a position the object table; a position measurement system () comprising a position sensor (-) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (), wherein a measurement beam () of the interferometer sensor is configured to irradiate a reflective surface () of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.

Interferometric stage positioning apparatus

An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

E-beam apparatus

An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

Electron beam inspection apparatus stage positioning

Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.

Stage system and metrology tool

A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.

Lithographic apparatus, and device manufacturing method

A stage system includes an object table constructed to hold an object, a short stroke actuator element constructed to displace the object table over a first range of movement, and a long stroke actuator element constructed to displace the short stroke actuator element over a second range of movement which is larger than the first range of movement. The stage system further includes a pneumatic compensation device including: a sensor arranged to measure a quantity representative of a pneumatic disturbance force on the short stroke actuator element, an actuator arranged to provide a compensating force to at least partly compensate the pneumatic disturbance, and a controller. The sensor is connected to a controller input of the controller, the actuator is connected to a controller output of the controller, the controller being arranged to drive the actuator in response to a signal received from the sensor.

Lithographic apparatus and stage system

A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless

A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.

Lithographic apparatus and device manufacturing method

A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.

Lithographic apparatus and position sensor

A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures having a plurality of local contact areas, respectively, on which the patterning object is disposed, in use, and a clamp configured to clamp the patterning object to the plurality of contact areas, wherein each structure is configured so that a local shear stiffness of each local contact area is substantially balanced with a local friction limit at each local contact area, respectively.

A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.

A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator device to exert a force onto the patterning device in a direction of movement of the support. The force actuator device includes a movable part which is pivotably about a pivot axis and thereby connected to the support. The movable part is in the direction of movement of the support substantially balanced with respect to the pivot axis. The force actuator device further includes an actuator to exert via the movable part the force onto the patterning device, to at least partly compensate for the information or a risk of slippage due to acceleration of the support in the direction of movement.

Lithographic apparatus and stage apparatus

A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.

Stage apparatus, lithographic apparatus and device manufacturing method

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Nuenen, Netherlands

Marcel Koenraad Marie Baggen