Neophotonics Corporation

Bookham Technology Limited

Marcel G Boudreau

Maxime Poirier

Raghuram Narayan

Chengkun Chen

Milind Gokhale

Kelvin Prosyk

David Seniuk

Robert Foster

Ronald S Moore

Optical modulators are described having a Mach-Zehnder interferometer and a pair of RF electrodes interfaced with the Mach-Zehnder interferometer in which the Mach-Zehnder interferometer comprises optical waveguides formed from semiconductor material. The optical modulator also comprises a ground plane spaced away in a distinct plane from transmission line electrodes formed from the association of the pair of RF electrodes interfaced with the Mach-Zehnder interferometer. The ground plane can be associated with a submount in which an optical chip comprising the Mach-Zehnder interferometer and the pair of RF electrodes is mounted on the submount with the two semiconductor optical waveguides are oriented toward the submount. Methods for forming the modulators are described.

High frequency optical modulator with laterally displaced conduction plane relative to modulating electrodes

An optical device, such as an electro-absorption modulator, has a waveguide formed onto a base. Electrodes adjacent the waveguide are used to selectively apply an electric field to the device in order to control the passage of light through the device. To prevent overheating of the device in a region near the point of optical entry, the electrode, which acts as a thermal conduit to dissipate heat from the waveguide is extended over the region. To prevent undesirable electrical contact between the electrode and the region, the normally electrically conducting contact layer between the electrode and the waveguide is removed in that region and replaced by an isolation dielectric.

Electrode, termination for reduced local heating in an optical device

Disclosed is a print quality test structure for devices manufactured by lithography. The test structure allows for visual inspection of the print quality of the device. The test structure decouples the effects of overexposure, underexposure and focus so that corrections can be made for future device manufacturing. By visually inspecting each device during lithography, devices of poor quality can be reworked, and costly testing on all devices can be avoided through device screening.

Print quality test structure for lithographic device manufacturing

Growing community of inventors

Ottawa, Canada

Marcel G Boudreau