Asml Netherlands B.v.

Carl-zeiss-smt Ag

Marcel Dierichs

Markus Franciscus Antonius Eurlings

Vadim Yevgenyevich Banine

Wolfgang Singer

Johannes Wangler

Jan Bernard Plechelmus Van Schoot

Hans Van Der Laan

Heine Melle Mulder

Martin Antoni

Antonius Johannes Josephus Van Dijsseldonk

Markus Weiss

Axel Scholz

Hendrikus Robertus Marie Van Greevenbroek

Karl Heinz Schuster

Philipp Bosselmann

Bernd Warm

Roel Moors

There is provided an illumination system that includes (a) a light source that emits light having a wavelength &#x2266;193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Illumination system for a wavelength of &#x2266; 193 nm, with sensors for determining an illumination

A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.

Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product

A method of operating a lithographic projection apparatus including forming a spot of radiation at the wafer level using a pinhole at reticle level. A sensor is defocused with respect to the spot such that it is spaced apart from the wafer level. The sensor is scanned beneath the spot to measure the angular intensity distribution of radiation at the spot and to determine the intensity distribution at the pupil plane of the projection lens system.

Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby

Growing community of inventors

Venlo, Netherlands

Marcel Dierichs