Asml Netherlands B.v.

Marcel Beckers

Nicolaas Rudolf Kemper

Nicolaas Ten Kate

Ferdy Migchelbrink

Sjoerd Nicolaas Lambertus Donders

Johannes Henricus Wilhelmus Jacobs

Christiaan Alexander Hoogendam

Elmar Evers

Martinus Hendrikus Antonius Leenders

Franciscus Johannes Joseph Janssen

Ivo Adam Johannes Thomas

Richard Moerman

Siebe Landheer

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Michel Riepen

Jeroen Peter Johannes Bruijstens

Erik Roelof Loopstra

Sergei Shulepov

Nicolas Alban Lallemant

Nicolaas Franciscus Koppelaars

Erik Henricus Egidius Catharina Eummelen

Koen Steffens

Paulus Martinus Maria Liebregts

Herman Boom

Cédric Désiré Grouwstra

Danny Maria Hubertus Philips

Carlo Cornelis Maria Luijten

Pieter Mulder

Anthonie Kuijper

Clemens Johannes Gerardus Van Den Dungen

Marco Polizzi

Adrianes Johannes Baeten

Evert Van Vliet

David Theodorus Willy Van Der Plas

Stephan Koelink

Remko Jan Peter Verhees

Anca Mihaela Antonevici

Martinus Cornelis Maria Verhagen

Ronald Van Der Ham

Leon Martin Levasier

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Rob Jansen

Pascal Antonius Smits

Martinus Hendrickus Antonius Leenders

Ronald Stultiens

Wladimir Fransiscus Gerardus Maria Hertog

Henk Krus

Jeroen Johannes Sophia Maria Mertens

Joeri Lof

Timotheus Franciscus Sengers

Roelof Frederik De Graaf

Tjarko Adriaan Rudolf Van Empel

Wilhelmus Josephus Box

Adrianus Hendrik Koevoets

Siegfried Alexander Tromp

Marcio Alexandre Cano Miranda

Paul Petrus Joannes Berkvens

Christianus Wilhelmus Johannes Berendsen

Marcel Johannus Elisabeth Hubertus Muitjens

Ronald Johannes Hultermans

Henricus Jozef Castelijns

Antonius Johannes Van Der Net

Nicolaas Antonius Allegondus Johannes Van Asten

Hubertus Antonius Geraets

Wouterus Johannes Petrus Maria Maas

Luberthus Ouwehand

Peter Schaap

Leon Joseph Marie Van Den Schoor

David Lucien Anstotz

Elke Van Loenhout

Yücel Kök

Bartholomeus Mathias Van Oerle

Rudolf Kemper

Jan-Marius Schotsman

Johannes Antonius Maria Martina Van Uijtregt

Wladimir Franciscus Gerardus Maria Hertog

Sergel Shulepov

A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Lithographic apparatus and device manufacturing method involving a barrier structure to handle liquid

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Lithographic apparatus

A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.

Lithographic apparatus and device manufacturing method

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

Lithographic apparatus, drying device, metrology apparatus and device manufacturing method

A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation

A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

A lithographic apparatus, including a movable table, a projection system configured to project a patterned radiation beam onto a substrate, and a liquid supply system configured to provide liquid to a space between a final element of the projection system and the table, the liquid supply system including an inlet configured to provide liquid to the space, the inlet including an array of inlet orifices located below a bottom surface of the final element and configured to provide an essentially horizontal flow of liquid therefrom, the array of inlet orifices extending along a side of an exposure field of the patterned radiation beam, and an extractor configured to remove liquid from the space, the extractor including a two dimensional array of outlet orifices, extending at least partly in a horizontal direction, through which the liquid can be extracted from the space.

Growing community of inventors

Eindhoven, Netherlands

Marcel Beckers