Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Marc Van Der Wijst

Erik Roelof Loopstra

Hans Butler

Bernhard Geuppert

Antonius Johannes Josephus Van Dijsseldonk

Dominicus Jacobus Petrus Adrianus Franken

Robertus Johannes Marinus De Jongh

Dick Antonius Hendrikus Laro

Jacob Kleijn

Rodolfo Guglielmi Rabe

Bastiaan S H Jansen

Marco Oude Nijhuis

Yim Bun Kwan

A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Veldhoven, Netherlands

Marc Van Der Wijst