Asml Netherlands B.v.

Mapper Lithography IP B.v.

Mapper Litohgraphy IP B.v.

Marc Smits

Chris Franciscus Jessica Lodewijk

Johan Joost Koning

Ludovic Lattard

Hindrik Willem Mook

Pieter Kruit

Christiaan Otten

Xuedong Liu

Xuerang Hu

Yang-Shan Huang

Johannes Cornelis Jacobus De Langen

Qingpo Xi

Xinan Luo

Stijn Wilem Herman Karel Steenbrink

Arjen Benjamin Storm

Aaron Yang-Fay Ayal

Johan Frederik Cornelis Van Gurp

Laura Del Tin

Laura Dinu Gurtler

Michiel Matthieu Bruinink

Christiaan Ruben Van Den Berg

Christan Teunissen

Peter-Paul Crans

Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.

Stack alignment techniques

A charged particle beam system is disclosed, comprising: Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

Replaceable module for a charged particle apparatus

A charged particle beam system is disclosed, comprising: wherein the charged particle optical element comprises: wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

Methods and arrangement for clamping substrates to a support using adhesive material area disclosed. The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support. The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.

Methods and systems for clamping a substrate

A lithography system () comprising a radiation projection system () for projecting radiation onto a substrate, a substrate transport system () for loading and positioning the substrate to be processed in the path of the projected radiation, a control system () for controlling the substrate transport system to move the substrate, and a resist characterization system () arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system () may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.

Method and apparatus for predicting a growth rate of deposited contaminants

The invention relates to an arrangement for transporting radicals. An electron beam system is presented comprising a beamlet generator; a beamlet manipulator () comprising an array of apertures; a plasma generator comprising a chamber for forming a plasma, an inlet receiving input gas and outlets removing plasma or radicals created therein, the plasma generator further comprising outlets in flow connection with the plasma chamber outlets; and a hollow guiding body () guiding radicals formed in the plasma towards the array of apertures for removing contaminant deposition. The hollow guiding body () is removably connectable to an extended portion () of the plasma generator outlet. A cover () can be placed over a connection between the hollow guiding body () and the extended portion (). The extended portion () of the plasma generator outlet and the hollow guiding body () can be similarly formed as a slit.

Arrangement for transporting radicals

An arrangement for generating plasma, the arrangement comprising a primary plasma source () comprising a primary source chamber () and a first coil () for generating plasma in the primary source chamber, a secondary plasma source () comprising a secondary source chamber () and a second coil () for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body () arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet () for emitting at least a portion of the plasma generated by the arrangement.

Plasma generator

The invention relates to an arrangement for transporting radicals. The arrangement includes a plasma generator and a guiding body. The plasma generator includes a chamber () in which a plasma may be formed. The chamber has an inlet () for receiving an input gas, and one or more outlets () for removal of at least one of the plasma and radicals created therein. The guiding body is hollow and is arranged for guiding radicals formed in the plasma towards an area or volume at which contaminant deposition is to be removed. The chamber inlet is coupled to a pressure device () for providing a pulsed pressure into the chamber so as to create a flow in the guiding body.

Growing community of inventors

Delft, Netherlands

Marc Smits