International Business Machines Corporation

Marc J Postiglione

Eric Peter Solecky

Javier Ayala

James V Iannucci

Neil J Peruffo

A system and method for optimizing and implementing a metrology sampling plan. A system is provided that includes a system for collecting historical metrology data from a metrology tool; and a reduction analysis system that compares an initial capability calculated from the historical metrology data with a recalculated capability for a reduced data set, wherein the reduced data set is obtained by removing a subset of data from the historical metrology data.

Automated dynamic metrology sampling system and method for process control

Disclosed is a method of operating a manufacturing facility. A processor detects whether abnormal first image data exists at a first common location for each of the last N wafers of the first set of wafers to be placed on a platform, excluding any abnormal image data at a location for wafers that previously had abnormal image data at the location; and detects whether abnormal second image data exists at as second common location for each of the last N wafers of the second set to be placed on the platform, excluding any abnormal image data at a location for wafers that previously had abnormal image data at the location. A decision is made whether to clean the platform depending on results from the processor.

Systems and methods of maintaining equipment for manufacturing semiconductor devices

A method for correcting misalignment between a reticle and a stage in a MICRASCAN step-and-repeat exposure system. In such a system, the reticle and the stage lie in parallel X-Y planes and there are at least two temperature sensors associated with the reticle, sensor and sensor , sensor having a sensor temperature output and sensor having a sensor temperature output. The method comprises the steps of estimating an X shift and a Y shift of the reticle relative to the stage using the sensor temperature output and sensor temperature output and correcting misalignment between the reticle and the stage using the estimated X and Y shifts.

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New Milford, CT, United States of America

Marc J Postiglione