Obducat Ab

Marc Beck

Babak Heidari

Matthias Keil

Göran Frennesson

Erik Bolmsjö

Erik Theander

Lars Montelius

Torbjörn Ling

Anette Löfstrand

Helena Eleonora Benedihta Riddargrip Beck, Legal Representative

Erik Ehrenborg

Apparatus and method for transferring a pattern from a template () having a structured surface to a substrate () carrying a surface layer of a radiation polymerisable fluid (). The apparatus comprises a first main part () and a second main part () having opposing surfaces (), means for adjusting a spacing () between said main parts, support means () for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source () devised to emit radiation into said spacing. A cavity () has a first wall comprising a flexible membrane () devised to engage said template or substrate, and means () are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

Device and method for large area lithography

The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected front the group consisting of phosphonic acids, phosphinic acids, phosphonates and phosphonate salts, phosphinates and phosphinate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain. 

Metal mold for use in imprinting processes

A template () having a first surface (), usable for transferring a pattern of the first surface to an object () having a second surface () covered by a light-sensitive coating (), by contacting the patterned first surface with the coating, wherein the template comprises a carrier base () of e.g. nickel, and a waveguide () is disposed on the carrier base at the first surface. The waveguide is devised to lead light therein, introduced at a radiation input, and to leak evanescent waves to portions () of the coating corresponding to said pattern. The template may also be devised with an opaque shield (), disposed at the first surface over selected portions of the waveguide, which serves to define where the evanescent waves can leak to the coating. The invention also relates to a method and an apparatus for using the template, and a method for manufacturing it.

Means for transferring a pattern to an object

Apparatus and method for transferring a pattern from a template () having a structured surface to a substrate () carrying a surface layer of a radiation polymerisable fluid (). The apparatus comprises a first main part () and a second main part () having opposing surfaces (), means for adjusting a spacing () between said main parts, support means () for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source () devised to emit radiation into said spacing. A cavity () has a first wall comprising a flexible membrane () devised to engage said template or substrate, and means () are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer ().

Device and method for lithography

Method for transferring a pattern from a template () having a structured surface () to a substrate () carrying a surface layer () of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tby means of a heater device (); and while maintaining said temperature T, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation () for solidifying the layer, and&#x2014;postbaking the layer.

Method for imprint lithography at constant temperature

A method is provided for transferring a pattern from a template () to an object () in an imprint process, using a two-step process. The first step includes contacting a pattern of the template surface with a polymer material comprising one or more Cyclic Olefin Copolymers (COCs), to produce a flexible polymer replica having a structured surface with an inverse of the pattern of the template surface. In a second step, after releasing the flexible polymer replica from the template, the inverse pattern of the flexible polymer replica is pressed into a resist layer on a substrate, to imprint a replica of the pattern of the template surface in therein.

Imprint stamp comprising cyclic olefin copolymer

The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected from the group consisting of phosphonic acids, phosphonic acids, phosphonates and phosphonate salts, phosphonates and phosphonate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.

Modified metal mold for use in imprinting processes

The invention relates to a two-step process for transferring a pattern from a template () to a target surface of a substrate, by creating an intermediate flexible polymer stamp () from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

Pattern replication with intermediate stamp

Method for manufacturing a mold tool (), devised for forming a structured nanoscale pattern on an object () and having a layer () which is anti-adhesive with regard to the object (). A stamp blank () is provided with a structured pattern () on a surface (). The patterned surface () is coated with a layer () of a metal, which has a stable oxidation number and can form a mechanically stable oxide film. The metal layer () is oxidized for forming of an oxide film (). The oxide film () is exposed to a reagent comprising molecule chains (), each of which has a linkage group () which bonds to the oxide film () by chemical bonding, wherein the molecule chains () either at the outset comprise at least a group () comprising fluorine, or in a subsequent step is provided with at least one such group ().

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Malmö, Sweden

Marc Beck