United Semiconductor (xiamen) Co., Ltd.

Crrc Zhuzhou Electric Locomotive Research Institute Co., Ltd.

Maohua Ren

Wen Yi Tan

Jing Shang

Yuan-Chi Pai

Ching-Shu Lo

Jun Tang

Guotao Jiang

Dian Han Liu

Qinghua Quan

Qi Lu

Bo Hao

Wenxin Wang

Chaoqun Shen

A reticle thermal expansion calibration method includes exposing a group of wafers and generating a sub-recipe, performing data mining and data parsing to generate a plurality of overlay parameters, extracting a plurality of predetermined parameters from the plurality of overlay parameters, performing a linear regression on each of the predetermined parameters, and generating a coefficient of determination for each of the predetermined parameters.

Reticle thermal expansion calibration method capable of improving sub-recipe

A lithography film stack applied to an immersion lithography process includes a photoresist, a wavelength adjusting layer and a top coating layer. The photoresist is disposed on a substrate. The wavelength adjusting layer is disposed on the photoresist. The top coating layer is disposed on the wavelength adjusting layer. A refractive index of the wavelength adjusting layer is greater than a refractive index of the top coating layer and a refractive index of an immersion fluid of the immersion lithography process.

Lithography film stack and lithography method

A method for aligning to a pattern on a wafer is disclosed. The method includes the steps of obtaining a first inline image from a first sample wafer, obtaining a first contour pattern of an alignment mark pattern from the first inline image, using the first contour pattern to generate a first synthetic image in black and white pixels, using the first synthetic image as a reference to recognize the alignment mark pattern on a tested wafer, and aligning to a tested pattern on the tested wafer according to a position of the alignment mark pattern on the tested wafer and a coordinate information.

Method for aligning to a pattern on a wafer

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Shamen, China

Maohua Ren