Ipg Photonics Corporation

Mobius Photonics, Inc.

Disco Corporation

Manuel J Leonardo

Gregory Lee Keaton

Mark W Byer

Igor Samartsev

Michael Von Dadelszen

Alexey V Avdokhin

Alexander Limanov

Mark Alan Arbore

Joshua Schoenly

James J Cordingley

Yuri Erokhin

Kiyomi Monro

David L Klein

John Lawrence Nightingale

Vadim Smirnov

Alex Yusim

Frank J Adams

Laura A Smoliar

Pancho Tzankov

Limanov Alexander

Alexey Avdokhin

Andreas Vaupel

Pankaj Kadwani

A laser system and method. In one example, the laser system includes an optical pulse stretcher configured to stretch pulse durations of an input train of input pulses to produce a train of stretched laser pulses, a pulse replicator module configured to increase a pulse repetition rate of the train of stretched laser pulses to produce a modified pulse train of laser light, a fiber power amplifier configured to amplify the modified pulse train to produce amplified laser pulses, and a pulse compressor that temporally compresses the amplified laser pulses to produce amplified and compressed laser pulses. The system may further include a nonlinear frequency conversion stage comprising at least one nonlinear crystal.

Ultrashort pulse laser source with chirped pulse amplification and tailored pulse train

A surface treating method and apparatus include operating a quasi-continuous wave fiber laser and pre-scan shaping the laser beam such that an instantaneous spot beam has predetermined geometrical dimensions, intensity profile, and power; operating a scanner at an optimal angular velocity and angular range to divide the pre-scan beam into at least one sub-beam deflected toward the surface being processed; guiding the sub-beam through a post-scan optical assembly to provide the spot beam with predetermined geometrical dimensions, power, and angular velocity and range, which are selected such that the instantaneous spot beam is dragged in a scan direction over a desired length at a desired scan velocity, which allow the treated surface to be exposed for a predetermined exposure duration and have a predetermined fluence distribution providing the treated surface with a quality comparable to that of the surface processed by an excimer laser or a burst-mode fiber laser.

Fiber laser apparatus and method for processing workpiece

A surface treating method and apparatus include operating a quasi-continuous wave fiber laser and pre-scan shaping the laser beam such that an instantaneous spot beam has predetermined geometrical dimensions, intensity profile, and power; operating a scanner at an optimal angular velocity and angular range to divide the pre-scan beam into a plurality of sub-beams deflected towards the surface being processed; guiding the sub-beams through a post-scan optical assembly to provide the spot beam with predetermined geometrical dimensions, power, and angular velocity and range, which are selected such that the instantaneous spot beam is dragged in a scan direction over a desired length at a desired scan velocity, which allow the treated surface to be exposed for a predetermined exposure duration and have a predetermined fluence distribution providing the treated surface with a quality comparable to that of the surface processed by an excimer laser or a burst-mode fiber laser.

A method of fiber laser processing of thin film deposited on a substrate includes providing a laser beam from at least one fiber laser which is guided through a beam-shaping unit onto the thin film. The beam-shaping optics is configured to shape the laser beam into a line beam which irradiates a first irradiated thin film area Ab on a surface of the thin film, with the irradiated thin film area Ab being a fraction of the thin film area Af. By continuously displacing the beam shaping optics and the film relative to one another in a first direction at a distance dy between sequential irradiations, a sequence of uniform irradiated thin film areas Ab are formed on the film surface defining thus a first elongated column. Thereafter the beam shaped optics and film are displaced relative to one another at a distance dx in a second direction transverse to the first direction with the distance dx being smaller than a length of the irradiated film area Ab. With the steps performed to form respective columns, the elongated columns overlap one another covering the desired thin film area Af. The dx and dy distances are so selected that that each location of the film area Af is exposed to the shaped laser beam during a cumulative predetermined duration.

Laser apparatus and method of processing thin films

The inventive system for crystallizing an amorphous silicon (a-Si) film is configured with a quasi-continuous wave fiber laser source operative to emit a film irradiating pulsed beam. The fiber laser source is operative to emit a plurality of non-repetitive pulses incident on the a-Si. In particular, the fiber laser is operative to emit multiple discrete packets of film irradiating light at a burst repetition rate (BRR), and a plurality of pulses within each packet emitted at a pulse repetition rate (PRR) which is higher than the BRR. The pulse energy, pulse duration of each pulse and the PRR are controlled so that each packet has a desired packet temporal power profile (W/cm) and packet energy sufficient to provide transformation of a-Si to polysilicon (p-Si) at each location of the film which is exposed to at least one packets.

Process and system for uniformly crystallizing amorphous silicon substrate by fiber laser

A laser system includes a seed source optically coupled to an extra cavity harmonic generator system may produce a round, non-astigmatic third harmonic output beam from a nominally round, non-astigmatic, diffraction limited input fundamental beam from the seed source. The system may include a second harmonic generation crystal. An input fundamental beam size is expanded in a non-walkoff direction for the SHG crystal at the SHG crystal input face. A higher harmonic generation crystal has an output face oriented at an oblique angle of incidence in a non-walkoff direction for the HHG crystal such that an output higher harmonic beam size is contracted in this direction. Expansion of the input fundamental beam at the SHG crystal input face exceeds reduction of third harmonic beam at the HHG crystal output face.

Laser system with highly efficient, single-pass, harmonic generator with round output beam

An RGB light source for a luminaire projector system includes Red, Green and Blue lasers each outputting a randomly polarized (RP) single mode (SM) light with at least a 4 nm spectral linewidth. The Green laser has a MOPFA-structured pump which outputs a pulsed pump beam at a fundamental wavelength in a 1 &#x3bc;m wavelength range and further includes a SHG. The SHG includes an LBO nonlinear crystal receiving the pulsed pump beam and outputting a train of pulses of BB Green light. The Red laser is configured with a QCW fiber laser pump and a frequency converter with an LBO nonlinear crystal outputting a train of pulses of red light in a 6xx nm wavelength range.

RGB laser source for luminaire projector system

A broad line red light generator is configured with a single mode (SM) pulsed ytterbium ('Yb') fiber laser pump source outputting pump light in a fundamental mode ('FM') at a pump wavelength which is selected from a 1030-1120 nm wavelength range. The disclosed generator further includes a SM fiber Raman converter spliced to an output of the Yb fiber laser pump source. The Raman converter induces an &#x201c;n&#x201d; order frequency Stokes shift of the pump light to output the pump light at a Raman-shifted wavelength within 1220 and 1300 nm wavelength range with a broad spectral line of at least 10 nm. The disclosed light generator further has a single pass second harmonic generator (&#x201c;SHG&#x201d;) with a lithium triborate (&#x201c;LBO&#x201d;) nonlinear optical crystal having a spectral acceptance linewidth which is sufficient to cover the broad spectral line of the pump light. The SHG generates a SM pulsed broad-line red light with a broad spectral line of at least 4 nm.

Broadband red light generator for RGB display

An extra cavity harmonic generator system may produce a round, non-astigmatic third harmonic output beam from a nominally round, non-astigmatic, diffraction limited input fundamental beam. The system may include a second harmonic generation crystal. An input fundamental beam size is expanded in a non-walkoff direction for the SHG crystal at the SHG crystal input face. A higher harmonic generation crystal has an output face oriented at an oblique angle of incidence in a non-walkoff direction for the HHG crystal such that an output higher harmonic beam size is contracted in this direction. Expansion of the input fundamental beam at the SHG crystal input face exceeds reduction of third harmonic beam at the HHG crystal output face.

Highly efficient, single-pass, harmonic generator with round output beam

A universal fiber optic connector includes a housing and a fiber attachment element configured to attach an optical fiber in the housing. The attachment element positions the optical fiber such that an end face of the fiber is held within the housing. The fiber end face is positioned such that a beam of light emerging from the fiber end face has a defined wavefront located at a specified interface.

Universal fiber optic connector

A pulsed laser system may include a Raman fiber that is configured to act as multiple wavelength Raman laser. The fiber is configured to receive a pulsed input beam from an input source and convert the input beam to an output beam having narrow band outputs at first and second frequencies vand v.

Multiple wavelength Raman laser

Multiple wavelength raman laser

A nonlinear optical system may include optics, a non-linear optical crystal, and a uni-axial focusing element. The non-linear optical crystal is configured to generate an output beam from a non-linear optical interaction with an input beam. The optics are configured to image the input beam to an original input beam waist within the non-linear optical crystal, whereby the output beam has an original output beam waist. The uni-axial focusing element is optically coupled to the non-linear optical crystal. The uni-axial focusing element is configured so that the output beam has a new output beam waist at approximately the same location as the original output beam waist.

Growing community of inventors

San Francisco, CA, United States of America

Manuel J Leonardo