Asml Netherlands B.v.

Manon Elise Will

Arnoud Willem Notenboom

Ronald Van Der Wilk

Roger Wilhelmus Antonius Henricus Schmitz

Noud Jan Gilissen

Sander Catharina Reinier Derks

Sebastiaan Maria Johannes Cornelissen

Anko Jozef Cornelus Sijben

Güneş Nakìboglu

Johannes Wilhelmus Mollen

Bas Cornelissen

Anko Sijben

A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.

Lithographic apparatus and method

A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck () for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus () by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (); a temperature conditioning fluid channel () formed within the chuck; a drive electrode () for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode () for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Chuck, a chuck control system, a lithography apparatus and a method of using a chuck

An electrostatic clamp () configured to hold an object, the electrostatic clamp comprising an electrode (), a resistive portion () formed from a resistive material located on the electrode, and a dielectric portion () formed from a dielectric material located on the resistive portion.

Electrostatic clamp, lithographic apparatus and method

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Eindhoven, Netherlands

Manon Elise Will