Samsung Electronics Co., Ltd.

Yonsei University

Industry-Academic Cooperation Foundation

Mann-Ho Cho

In-Seok Yeo

Woo Bin Song

Dong Chan Suh

Kwang Sik Jeong

Dae-Hong Ko

Myung-jong Kim

Sang-Yeon Kim

Hyun-Chul Sohn

A method for manufacturing a semiconductor device with an improved doping profile is provided. The method includes providing a measuring target including a first region having a plurality of layers, inputting a first input signal into the measuring target and measuring a resulting first output signal, such as a change over time of a first output electric field that is transmitted through or reflected by the first region. Based on a first model including first structural information of a plurality of first modeling layers and information on doping concentrations of each of the plurality of first modeling layers, calculating a second output signal. When a result of comparing the first output signal with the second output signal is smaller than a threshold value, a three-dimensional model of the measuring target may be estimated based on the first model. Such non-destructive measurements may be used to determine manufacturing process parameters corresponding to ideal doping profiles and used to manufacture semiconductor devices implementing such manufacturing process parameters.

Method of manufacturing a semiconductor device using the same

Example methods and example embodiments include methods of fabricating semiconductor devices and semiconductor devices fabricated by the same. Example fabricating methods include forming a first nanowire, oxidizing the first nanowire to form a first nanostructure including a first insulator and a second nanowire, and oxidizing the second nanowire to form a second nanostructure including a second insulator and nanodots. Example semiconductor devices include nanostructures including nanodots and nanostructures providing storage nodes in memory devices.

Methods of fabricating semiconductor devices and semiconductor devices fabricated by the same

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Seoul, South Korea

Mann-Ho Cho