Applied Materials, Inc.

Manjunatha P Koppa

Jallepally Ravi

Cheng-Hsiung Matt Tsai

Steven Victor Sansoni

Sandesh Yadamane

Aravind Kamath

Mukund Sundararajan

Shreyas Patil Shanthaveeraswamy

Dien-Yeh Wu

Cheng-Hsiung Matthew Tsai

Shreesha Y Rao

Vinod Konda Purathe

Xiaoxiong Yuan

Zubin Huang

David T Or

Harpreet Singh

Srinivas Tokur Mohana

Manjunath H Venkataswamappa

Yu Lei

Ananthkrishna Jupudi

Yi Xu

Pingyan Lei

Vijay D Parkhe

John C Forster

Muhammad M Rasheed

Keith A Miller

Kadthala Ramaya Narendrnath

Mehran Behdjat

Yu Wen Chang

Muhannad Mustafa

Govinda Raj

Mario Dan Sanchez

Takashi Kuratomi

Sarath Babu

Robert Hirahara

Ryan Hanson

Hiroyuki Takahama

William Kuang

Bonnie T Chia

Tomoharu Matsushita

Saket Rathi

Geraldine M Vasquez

Ross Marshall

Youqun Dong

Ambarish Toorihal

Process chamber shower head

Process chamber manifold

Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.

Gas distribution ceramic heater for deposition chamber

Embodiments of a substrate support are provided herein. In some embodiments, a substrate support for use in a substrate processing chamber includes a lower assembly having a base plate assembly, wherein the base plate assembly includes a plurality of electrical feedthroughs disposed about a central protrusion; a ceramic puck disposed on the lower assembly and removeably coupled to the base plate assembly, wherein the ceramic puck has an electrode disposed therein that is electrically coupled to first pair of electrical feedthroughs of the plurality of electrical feedthroughs; and a flexible connector having a spiral portion disposed between the ceramic puck and each of the plurality of electrical feedthroughs to allow for differences in thermal expansion of the ceramic puck and the base plate assembly.

Detachable biasable electrostatic chuck for high temperature applications

Shadow ring lift pin

Shadow ring lift assembly

Shadow ring lift plate

Embodiments of showerheads are provided herein. In some embodiments, a showerhead for use in a process chamber includes a gas distribution plate having an upper surface and a lower surface; a plurality of channels extending through the gas distribution plate substantially perpendicular to the lower surface; a plurality of first gas delivery holes extending from the upper surface to the lower surface between adjacent channels of the plurality of channels to deliver a first process gas through the gas distribution plate; and a plurality of second gas delivery holes extending from the plurality of channels to the lower surface to deliver a second process gas therethrough without mixing with the first process gas.

High temperature dual chamber showerhead

Base plate for a processing chamber substrate support

Substrate processing chambers with integrated shutter garage are provided herein. In some embodiments, a pre-clean substrate processing chamber may include a chamber body, wherein the chamber body includes a first side configured to be attached to mainframe substrate processing tool, and a second side disposed opposite the first side, a substrate support configured to support a substrate when disposed thereon, a shutter disk garage disposed on the second side of the process chamber, and a shutter disk assembly mechanism comprising a rotatable shaft, and a robot shutter arm coupled to the shaft, wherein the robot shutter arm includes a shutter disk assembly support section configured to support a shutter disk assembly, and wherein the shutter disk assembly mechanism is configured to move the robot shutter arm between a storage position within the shutter garage and a processing position within the process chamber over the substrate support.

Pre-clean chamber with integrated shutter garage

Process shield for a substrate processing chamber

Deposition ring for a substrate processing chamber

Embodiments of lift pin assemblies are provided herein. In some embodiments, a lift pin assembly includes an elongate base formed of a first material and having a first feature formed in a distal end of the base to interface with and removably support a tip; and a tip formed of a second material different than the first material and having a support surface on a first side of the tip and an opposing second side of the tip, wherein the opposing second side includes a second feature to mate with the first feature of the base to removably retain the tip on the distal end of the base.

Lift pin assembly

Growing community of inventors

Bengaluru, India

Manjunatha P Koppa