Applied Materials, Inc.

Manjunath H Venkataswamappa

Cheng-Hsiung Matt Tsai

Steven Victor Sansoni

David T Or

Manjunatha P Koppa

Aravind Kamath

Ananthkrishna Jupudi

Mukund Sundararajan

Saket Rathi

Process shield for a substrate processing chamber

Deposition ring for a substrate processing chamber

In some embodiments, a process chamber for a microwave batch curing process includes: an annular body having an outer surface and an inner surface defining a central opening of the annular body, wherein the inner surface comprises a plurality of angled surfaces defining a first volume; a first lip extending radially outward from the outer surface of the annular body proximate a first end of the annular body; a second lip extending radially outward from the outer surface of the annular body proximate a second end of the annular body; an exhaust disposed between the first lip and the second lip and fluidly coupled to the first volume, wherein the exhaust comprises a plurality of first openings; a plurality of second openings fluidly coupled to the first volume, wherein the plurality of second openings are configured to expose the first volume to microwave energy; and one or more ports fluidly coupled to the first volume.

Methods and apparatus for a microwave batch curing process

Growing community of inventors

Bengaluru, India

Manjunath H Venkataswamappa