Asml Netherlands B.v.

Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Manisha Ranjan

Derk Jan Wilfred Klunder

Ruud Antonius Catharina Maria Beerens

Martin Lambert

Frank B Sperling

Tolga Ergin

Stefan Michael Bruno Bäumer

Andrey Sergeevich Tychkov

Stefan Piehler

Andreas Kristian Hopf

Jasper Witte

Jiayue Yuan

Nico Johannes Antonius Hubertus Boonen

A laser focusing system () for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror () configured to receive a laser beam from a beam delivery system () and generate a first reflected laser beam (); •—a second curved mirror () configured to receive the first reflected laser beam () and generate a second reflected laser beam (), wherein the laser focusing system () is configured to focus the second reflected laser beam () to a target location () in a vessel () of the EUV radiation source ().

Laser focussing module

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Eindhoven, Netherlands

Manisha Ranjan