Asml Netherlands B.v.

Asml Holding N.v.

Manish Ranjan

Franciscus Johannes Joseph Janssen

Marcus Adrianus Van De Kerkhof

Kursat Bal

Jan Bernard Plechelmus Van Schoot

Han-Kwang Nienhuys

Leon Martin Levasier

Marcio Alexandre Cano Miranda

Yuri Johannes Gabriël Van De Vijver

Danny Maria Hubertus Philips

Martinus Agnes Willem Cuijpers

Carlo Cornelis Maria Luijten

Roger Wilhelmus Antonius Henricus Schmitz

Oleg Voznyi

Alain Louis Claude Leroux

Albert Pieter Rijpma

Oleksiy Galaktionov

Maksym Chernyshov

Nicolaas Ten Kate

Johannes Hubertus Josephina Moors

Johannes Henricus Wilhelmus Jacobs

Theodorus Marinus Modderman

Richard Joseph Bruls

Andrey Alexandrovich Nikipelov

Joseph Harry Lyons

Laurentius Johannes Adrianus Van Bokhoven

Yang-Shan Huang

Derk Servatius Gertruda Brouns

Olav Waldemar Vladimir Frijns

Edwin Te Sligte

Aage Bendiksen

Ronald Peter Albright

Zhuangxiong Huang

Joshua Adams

Richard Jacobs

Andrew Judge

Parham Yaghoobi

Karl Robert Umstadter

Sjoerd Frans De Vries

Thomas Maarten Raasveld

Eray Uzgören

Veera Venkata Narasimha Narendra Phani Kottapalli

Xugang Xiong

Vadim Yevgenyevich Joseph Banine

Georgi Nenchev Nenchev

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.

Lithographic apparatus and method with improved contaminant particle capture

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

Apparatus and method for determining a condition associated with a pellicle

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

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Eindhoven, Netherlands

Manish Ranjan