Lg Electronics Inc.

Shangrao Jinko Solar Technology Development Co., Ltd

Manhyo Ha

Juhwa Cheong

Youngsung Yang

Yongduk Jin

Kyoungsoo Lee

Seongeun Lee

Yiyin Yu

Jonghwan Kim

Daehee Jang

Juwan Kang

Sangwook Park

Junyong Ahn

Giwon Lee

A solar cell can include a front passivation region including a plurality of layers formed of different materials from each other and including a first aluminum oxide layer and a first silicon nitride layer, and a back passivation region including a plurality of layers formed of different materials from each other and including a second aluminum oxide layer and a second silicon nitride layer, wherein a thickness of a first silicon nitride layer is greater than a thickness of the first aluminum oxide layer, and a thickness of a second silicon nitride layer is greater than a thickness of the second aluminum oxide layer.

Solar cell

A solar cell includes a substrate having a textured surface, the textured surface including a plurality of jagged portions; an emitter region forming a p-n junction with the substrate; a plurality of first electrodes connected to the emitter region; and a second electrode connected to the substrate, wherein each of the plurality of jagged portions has a diameter and a height that are equal to or less than 1 &#x3bc;m, and each of the plurality of first electrodes has a width of about 20 &#x3bc;m to about 80 &#x3bc;m.

A solar cell can include a substrate of a first conductive type; an emitter region which is positioned at a front surface of the substrate and has a second conductive type different from the first conductive type; a back surface field region which is positioned at a back surface opposite the front surface of the substrate; a front passivation region including a plurality of layers which are sequentially positioned on the emitter region; a back passivation region including a plurality of layers which are sequentially positioned on the back surface field region; a front electrode part which passes through the front passivation region and is connected to the emitter region, wherein the front electrode part comprises a plurality of front electrodes that are apart from each other and a front bus bar connecting the plurality of front electrodes; a back electrode part which passes through the back passivation region and is connected to the back surface field region, wherein the back electrode part comprises a plurality of back electrodes that are apart from each other and a back bus bar connecting the plurality of back electrodes, wherein the front passivation region includes a first aluminum oxide layer and the back passivation region includes a second aluminum oxide layer.

A method for manufacturing a solar cell, the method including: preparing a semiconductor substrate; ion-implanting a pre-amorphization element to form an amorphous layer at at least a part of one surface of the semiconductor substrate; ion-implanting a first conductive type dopant to the one surface of the semiconductor substrate to form a first dopant layer; and forming a first electrode electrically connected to the first dopant layer, wherein a concentration of the pre-amorphization element in one portion of the first dopant layer is different from a concentration of the pre-amorphization element in another portion of the first dopant layer.

Solar cell and method for manufacturing the same

A method for manufacturing a solar cell includes forming a first dielectric layer on a second surface opposite a first surface of a substrate; forming second dielectric layers respectively on an emitter region and the first dielectric layer; forming a third dielectric layer on the second dielectric layer that is positioned on the emitter region; forming a hydrogenated silicon oxide layer on the third dielectric layer; forming a first electrode on the emitter region and connected to the emitter region; and forming a second electrode on the second surface of the substrate and connected to the substrate, wherein the first surface of the substrate has first and second textured surfaces, and wherein the first textured surface includes a plurality of first protrusions and a plurality of first depressions and the second textured surface includes a plurality of second protrusions and a plurality of second depressions.

A solar cell is discussed. The solar cell includes a semiconductor substrate of a first conductive type, an emitter region of a second conductive type opposite the first conductive type, which is positioned at a front surface of the semiconductor substrate, a front passivation part positioned on a front surface of the emitter region, a front electrode part which passes through the front passivation part and is electrically connected to the emitter region, a back passivation part positioned on a back surface of the semiconductor substrate, and a back electrode part which passes through the back passivation part and is electrically connected to the semiconductor substrate. The front passivation part and the back passivation part each include a silicon oxide layer. One of the front passivation part and the back passivation part includes an aluminum oxide layer.

A solar cell according to an embodiment includes a semiconductor substrate; a first dopant layer formed at one surface of the semiconductor substrate; and a first electrode electrically connected to the first dopant layer. At least a part of the first dopant layer includes a pre-amorphization element, and a concentration of the pre-amorphization element in one portion of the first dopant layer is different from a concentration of the pre-amorphization element in another portion of the first dopant layer.

A solar cell is discussed. The solar cell includes a substrate of a first conductive type, an emitter region which is positioned at a front surface of the substrate and has a second conductive type different from the first conductive type, a front passivation region including a plurality of layers which are sequentially positioned on the emitter region, a back passivation region which is positioned on a back surface opposite the front surface of the substrate and includes three layers, a plurality of front electrodes which pass through the front passivation region and are connected to the emitter region, and at least one back electrode which passes through the back passivation region and is connected to the substrate.

In a method of manufacturing a solar cell includes forming a dopant layer by doping a dopant of a first conductive type and a counter dopant of a second conductive type opposite to the first conductive type to a surface of a semiconductor substrate. Here, a doping amount of the counter dopant is less than a doping amount of the dopant.

Solar cell, method for manufacturing dopant layer, and method for manufacturing solar cell

A method for manufacturing a dopant layer of a solar cell according to an embodiment of the invention includes: ion-implanting a dopant to a substrate; and heat-treating for an activation of the dopant. In the heat-treating for the activation, the substrate is heat-treated at a first temperature after an anti-out-diffusion film is formed at a temperature lower than the first temperature under a first gas atmosphere.

Method for manufacturing solar cell and dopant layer thereof

A solar cell and a method for manufacturing the same are discussed. The solar cell includes a substrate formed of an n-type crystalline semiconductor, an emitter region of a p-type positioned at a first surface of the substrate, a first dielectric layer positioned on a second surface opposite the first surface of the substrate, second dielectric layers respectively positioned on the emitter region and the first dielectric layer, a third dielectric layer positioned on the second dielectric layer that is positioned on the emitter region, a first electrode which is positioned on the first surface of the substrate and is connected to the emitter region, and a second electrode which is positioned on the second surface of the substrate and is connected to the substrate.

The present invention relates to solar cells. Such solar cells include a substrate containing a first impurity of a first conductive type and having a textured surface with a plurality of jagged portions. Such solar cells also have an emitter layer positioned on the textured surface and containing a second impurity of a second conductive type opposite to the first conductive type, a first electrode having a plurality of first metal particles, electrically connected to the emitter layer, and a second electrode electrically connected to the substrate. The diameter of the first metal particles is larger than the peak-to-peak distance between adjacent jagged portions.

Solar cell and method of manufacturing the same

A solar cell includes a substrate of a first conductive type; an emitter part of a second conductive type positioned at a front surface of the substrate; a first silicon thin film layer positioned on the emitter part and including amorphous silicon containing impurities of the second type that are doped therein; a first transparent conductive layer positioned on the first silicon thin film layer and electrically connected with the emitter part; a first electrode positioned on the first transparent conductive layer and electrically connected with the first transparent conductive layer; and a second electrode positioned on a back surface of the substrate. For example, the first silicon thin film layer includes N-a-Si:H or N-a-SiC:H.

Growing community of inventors

Seoul, South Korea

Manhyo Ha