Siemens Aktiengesellschaft

Manfred Schreiner

Harry Hedler

Karl Weidner

Maximilian Fleischer

Jörg Zapf

Kerstin Wiesner

Markus Schieber

Oliver Freudenberg

At least two separate single-crystal silicon layers are formed in a micromechanical substrate which has a diaphragm in a partial region. The diaphragm has a thickness of less than 20 &#x3bc;m and includes part of a first of the single-crystal silicon layers. The substrate construction also includes a heating element configured to generate a temperature of more than 650&#xb0; C. in at least part of the diaphragm. The substrate includes at least one diffusion barrier layer that reduces the oxidation of the first single-crystal silicon layer.

Micromechanical substrate for a diaphragm with a diffusion barrier layer

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Gauting, Germany

Manfred Schreiner