Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Manfred Neumann

Siegfried Schiller

Nicolas Schiller

Henry Morgner

Klaus Goedicke

Steffen Straach

Volker Kirchhoff

Fred Fietzke

Falk Milde

Jonathan Reschke

Mario Krug

Gerhard Zeissig

The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.

Device for plasma-activated vapor coating of large surfaces

Process for producing organically modified oxide, oxynitride or nitride

Process for ion-supported vacuum coating

Apparatus for plasma-assisted high rate electron beam vaporization

Method for plasma-assisted reactive electron beam vaporization

Growing community of inventors

Dresden, Germany

Manfred Neumann