Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Tooz Technologies Gmbh

Carl-zeiss-stiftung

Carl Zeiss Semiconductor Manufacturing Technologies Ag

Manfred Maul

Damian Fiolka

Markus Deguenther

Johannes Wangler

Axel Scholz

Michael Layh

Michael Patra

Michael Gerhard

Vladimir Davydenko

Johannes Eisenmenger

Andras G Major

Toralf Gruner

Yim-Bun Patrick Kwan

Christian Wagner

Stefan Xalter

Frank Schlesener

Jan Horn

Florian Bach

Winfried M Kaiser

Martin Brunotte

Gundula Weiss

Wilhelm Ulrich

Wolfgang Singer

Nils Haverkamp

Sascha Bleidistel

Thomas Bischoff

Gerhard-Wilhelm Ziegler

Thomas Stammler

Birgit Enkisch

Daniel Krähmer

Daniel Walldorf

Stephan Kellner

Christof Zaczek

Mirco Kern

Igor Hurevich

Alexander Kohl

Markus Schwab

Nils Dieckmann

Olaf Dittmann

Ralf Scharnweber

Heiko Siekmann

Reinhard Voelkel

Gerd Reisinger

Kenneth Weible

Wolfgang Seitz

Uwe Spengler

Jens Kugler

Hubert Holderer

Ulrich Wegmann

Karsten Lindig

Markus Weiss

Rudolf Von Buenau

Paul Graeupner

Martin Schriever

Oliver Natt

Markus Brotsack

Stefanie Hilt

Christian Hettich

Philipp Bosselmann

Jürgen Hartmaier

Karl-Heinz Schuster

Hans-Juergen Dobschal

Daniel Kraehmer

Johannes Ruoff

Ingo Saenger

Gerhard Kelch

Thomas Korb

Jochen Hetzler

Wolfgang Emer

Georg Michels

Joerg Puetz

Joachim Hainz

Norbert Kerwien

Gerhard Fuerter

Rafael Egger

Christoph Hennerkes

Hans-Jürgen Dobschal

Joachim Wietzorrek

Momchil Davidkov

Joerg Schultz

Ersun Kartal

Wolf Krause

Jess Koehler

Yim-Bun-Patrick Kwan

Lisa Riedel

Jörg Pütz

Dieter Schmerek

Birgit Kuerz

Diana Tonova

Markus Degünther

Detlev Mueller

Frank Marianek

Juergen Hartmaier

Torsten Braendle

Otto Hahnemann

Matthias Kuss

Gabriele Weirauch

András G Major

Reinhard Völkel

Ingo SÄNGER

An illumination system of a microlithographic projection apparatus includes a spatial light modulator having a modulation surface including a plurality of micromirrors. Each micromirror includes a mirror surface having an orientation that can be changed individually for each micromirror. For at least one of the micromirrors, at least one parameter that is related to the mirror surface is measured. The orientation of the mirror surfaces is controlled depending on the at least one measured parameter. A light pattern is produced on the modulation surface, and an image of the light pattern is formed on an optical integrator that has a plurality of light entrance facets. Images of the light entrance facets are superimposed on a mask.

Method of operating a microlithographic projection apparatus and illumination system of such an apparatus

A method for adjusting a display device with a holder that can be fitted on the head of a user includes a front section in which two spectacle lenses are arranged which are connected to each other via a central part, an imaging unit secured to the holder, which generates an image, and an imaging optical system secured to the holder which, when the holder is fitted on the head of the user, images the generated image into an exit pupil such that the user can perceive it as a virtual image with his first eye. The first spectacle lens with the coupling-out section is positioned in such a way that the exit pupil of the imaging optical system coincides at least partially with the pupil of the first eye of the user when the holder is fitted on the head of the user.

Method for adjusting a display device

A microlithography projection exposure apparatus includes illumination optics configured to illuminate object field points of an object field in an object plane, and projection optics configured to image the object field onto an image field in an image plane. The illumination optics includes a multi-mirror array which includes a plurality of mirrors configured to adjust an intensity distribution in exit pupils associated with the object field points. The illumination optics also includes an optical system configured to produce, via an incoherent superposition of illumination rays, a temporal modification of a temporal stabilization of an illumination of the multi-mirror array. The optical system includes a mirror which includes a mirror surface. In addition, the optical system includes an actuator configured to produce a tilt of at least a portion of the mirror surface.

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.

Illumination system for microlithography

The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105&#xb0;.

Correction of optical elements by correction light irradiated in a flat manner

A spectacle lens for a display device can be fitted on the head of a user and generate an image. The spectacle lens can be constructed with several shells including an outer shell and an inner shell which is joined to the outer shell, wherein a curved channel shell, which includes a curved first reflecting surface and a curved second reflecting surface, is arranged between the outer and inner shell. The light guiding channel includes at least one section of the channel shell and the two reflecting surfaces on which the light bundles are reflected for guiding from the coupling-in section to the coupling-out section.

Spectacle lens for a display device that can be fitted on the head of a user and generates an image

An illumination optical unit for projection lithography illuminates an object field with illumination light. The illumination optical unit has a collector for collecting the emission of a light source for the illumination light. The collector is arranged such that it transfers the illumination light from the light source into an intermediate focus. The illumination optical unit furthermore has a field facet mirror and a pupil facet mirror, each having a plurality of facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has an individual-mirror array having individual mirrors tiltable in a manner driven individually. The array is arranged upstream of the field facet mirror and downstream of the intermediate focus in an illumination beam path.

Illumination optical unit for projection lithography

An EUV light source serves for generating a usable output beam of EUV illumination light for a projection exposure apparatus for projection lithography. The light source has an EUV generation device which generates an EUV raw output beam. The latter is circularly polarized. For the purposes of setting the polarization of the usable output beam and in respect of the polarization direction, a polarization setting device has a linearly polarizing effect on the raw output beam. This results in an EUV light source, which provides an improved output beam for a resolution-optimized illumination.

EUV light source for generating a usable output beam for a projection exposure apparatus

Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

The disclosure provides an illumination optical unit for projection lithography, which illuminates an object field with illumination light. The illumination optical unit includes a field facet mirror with a plurality of field facets and a pupil facet mirror with a plurality of pupil facets. The field facets are imaged in the object field by a transfer optical unit. The pupil facet mirror includes a pupil facet mirror polarization section and a pupil facet mirror neutral section. The polarization section is arranged so that the illumination light is reflected in the region of a Brewster angle. The neutral section is arranged so that the illumination light is reflected in the region of a normal incidence.

An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light.

An illumination optical unit for projection lithography serves for illuminating an object field, in which an object to be imaged can be arranged, with illumination light. The illumination optical unit has a field facet mirror having a plurality of field facets. Furthermore, the illumination optical unit has a pupil facet mirror having a plurality of pupil facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has a deflection facet mirror having a plurality of deflection facets, which is arranged in the illumination beam path between the field facet mirror and the pupil facet mirror. This results in an illumination optical unit in which the illumination of the object to be imaged can be configured flexibly and can be adapted well to predefined values.

The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising a mirror arrangement composed of a plurality of mutually independently adjustable mirror elements, and at least one polarization-influencing arrangement arranged upstream of the mirror arrangement relative to the light propagation direction, wherein the polarization-influencing arrangement has a group of first reflection surfaces and a group of second reflection surfaces, wherein the first reflection surfaces are tiltable independently of one another, and wherein, during the operation of the optical system, light reflected at respectively one of the first reflection surfaces can be directed onto the mirror arrangement via respectively a different one of the second reflection surfaces depending on the tilting of the first reflection surface.

Optical system of a microlithographic projection exposure apparatus

A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Illumination system for a microlithographic projection exposure apparatus

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Aalen, Germany

Manfred Maul