Hoechst Aktiengesellschaft

Leybold Vakuum Gmbh

Imm, Institut Fur Mikrotechnik Gmbh

Institut Fuer Mikrotechnik Gmbh

Manfred Lacher

Thomas Zetterer

Martin Bruck

Werner Grosse Bley

Tilo Vaahs

Wolfgang Ehrfeld

Thomas Bohm

Michael Abraham

Ulrich Dobler

Wolfgang Bocker

Alexander Ruf

Thomas R Dietrich

Ludwig Giebel

A gas passage (,) with a selectively acting penetration surface consisting of quartz, quartz glass, Pyrex glass or the like; in order to provide penetration surfaces which are relatively thin on the one hand but will withstand relatively great pressure differences on the other, it is proposed that the selectively acting penetration surface take the form of a plurality of adjacent windows (,).

Gas passage with selectively acting penetration surface and process for producing the penetration surface

A process for producing a ceramic having a microstructured surface with a surface profile depth of less than 1 micron, measured by the atomic force microscopy, comprising preparing a polymeric precursor material, shaping the precursor material into a structured mold insert of an inherently stable mold insert material having a structured surface geometry corresponding with the microstructured surface of the ceramic to form a shaped precursor material, the shaped precursor material being rendered infusible by chemical crosslinking, and wherein the inherently stable mold insert material is selected from materials having sufficient strength for structuring and high molding accuracy, and pyrolyzing the shaped precursor material, whereby the ceramic having the microstructured surface is obtained.

Process for producing ceramic microstructures from polymeric precursors

A sensor head (1) is described, which has a spacer (5b) between a carrier element (2) and the spring arm (7), which, perhaps carries a sensor tip (9) at the free end; the spacer defines the distance d between the spring arm (7) and the carrier element (2). In a preferred embodiment, the spacer (5b) comprises a sacrificial layer (5a), which is etched out, except for the spacer (5b), after the formation of a corresponding layer system between the spring arm (7) and the carrier element (2). The carrier element (2) and the spring arm (7) are each provided with a reflecting layer (4 and 6). In accordance with another specific embodiment, plasmonactive layers can also be provided.

Sensor head for use in atomic force microscopy and method for its

Growing community of inventors

Mainz, Germany

Manfred Lacher