Ciba-Geigy Corporation

Ciba Specialty Chemicals Corporation

Olin Microelectronic Chemicals, Inc.

Novartis Ag

Ocg Microelectronic Materials, Inc.

Arch Specialty Chemicals, Inc.

Manfred Hofmann

Adrian Schulthess

Ulrich Schaedeli

Walter Fischer

Jurgen Finter

Max Hunziker

Ernst Minder

Heinz Spahni

Eric Tinguely

Carl-Lorenz Mertesdorf

Pasquale Alfred Falcigno

Evelyn Fischer

Bettina Steinmann

Fritz Herren

Rolf Wiesendanger

Bernd Klingert

Norbert Muenzel

Arnold Grubenmann

Paul Bernhard

Fridolin Babler

Carl W Mayer

Xiaoxiao Zhang

John S Zambounis

Bruno Hilti

Andre Pugin

Ulrich Schadeli

Juergen Vogt

Jurgen Pfeiffer

Heinrich Gugger

Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical groups, which can be converted into groups with aromatic structural elements (latent aromatic groups) under process conditions, for which an image structure comprised of the resist material is not disrupted. A preferred component with latent aromatic groups is bicyclo[3.2.2]nona-6,8-dien-3-one. Resist coatings, which are produced with these compositions, show a stability in plasma etching, which is comparable with the stability of conventional resists based on phenolic resins.

Wet-chemical, developable, etch-stable photoresist for UV radiation with

A radiation sensitive composition comprising (a) a terpolymer containing 20 to 70 mole percent of an acid-labile repeating unit, 3 to 40 mole percent of an acrylic or acrylonitrile based repeating unit and a repeating unit containing silicon side-chains and (b) a photo-acid generator. The silicon content of terpolymer is 7 to 20 weight percent. The composition is used primarily in the formulation of multilayer positive operating photoresists.

Radiation sensitive compositions of terpolymers containing organosilicon

A terpolymer containing 20 to 70 mole percent of an acid labile repeating unit, 3 to 40 mole percent of an acrylonitrile based repeating unit and a repeating unit containing silicon side chains. The silicon side chain repeating unit is provided in sufficient amounts so that the terpolymer silicon content is 7 to 20 weight percent. The terpolymer is used primarily in the formulation of multilayer positive operating photoresists.

Terpolymers containing organosilicon side chains

The invention provides a crosslinkable or polymerizable optical material that is suitable for producing a biocompatible holographic optical element. The optical material is a rapidly crosslinking or polymerizing material that changes from a fluid state to a solid state with in a limited duration after being exposed to a light source.

Actively controllable multifocal lens

Process for the stereolithographic preparation of three-dimensional

A terpolymer containing 20 to 70 mole percent of an acid labile repeating unit, 3 to 40 mole percent of an acrylic acid or acrylonitrile based repeating unit and a repeating unit containing silicon side chains. The silicon side chain repeating unit is provided in sufficient amounts so that the terpolymer silicon content is 7 to 20 weight percent. The terpolymer is used primarily in the formulation of multilayer positive operating photoresists.

The present invention provides a process for the preparation of a material comprising a substrate on whose surface there is at least one pigment coating consisting of one or more pigments of the formula (I) or (II) or derivatives thereof

Structured pigment coating and its preparation and use

The invention relates to a process for stabilizing a liquid radiation-curable composition comprising a cationically polymerizable compound and a photoinitiator for cationic polymerization against premature commencement of the polymerization, in which a basic ion exchanger is brought into contact with the composition, at least for a certain time. The ion exchanger is preferably removed before commencement of the radiation curing, at least from the part of the radiation-sensitive composition which comes into contact with the radiation. The process is particularly suitable for stabilizing stereolithography baths in extended use against an undesired increase in viscosity.

Stabilization of liquid radiation-curable compositions against undesired

Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical groups, which can be converted into groups with aromatic structural elements (latent aromatic groups) under process conditions, for which an image structure comprised of the resist material is not disrupted. A preferred component with latent aromatic groups is bicyclo�3.2.2!nona-6,8-dien-3-one Resist coatings, which are produced with these compositions, show a stability in plasma etching, which is comparable with the stability of conventional resists based on phenolic resins.

Wet-chemical developable, etch-stable photoresist for UV radiation with

A process is described for the preparation of photopolymerizable compositions, wherein the photopolymerizable compositions can be photopolymerized by the irradiation of emission lines of differing wavelength from a UV/VIS laser light source, and contain a photopolymerizable compound and at least two photoinitiators, by adjusting the sensitivity to radiation. The ratio between the concentrations of the individual photoinitiators is so adjusted that the composition has virtually the same optical density for the radiation of the different emission lines at which the photoinitiators are effective.

Process for adjusting the sensitivity to radiation of photopolymerizable

Compounds of formula V, ##STR1## wherein R is unsubstituted C.sub.6 -C.sub.14 aryl or C.sub.6 -C.sub.14 aryl which is substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, C.sub.1 -C.sub.12 alkylthiol, phenyl, benzyl, --CN, --CF.sub.3, halogen or --COOR.sub.5, and R.sub.5 is H, C.sub.1 -C.sub.18 alkyl, cyclohexyl, cyclopentyl, phenyl, C.sub.1 -C.sub.12 alkylphenyl, benzyl or C.sub.1 -C.sub.12 alkylbenzyl, and at least one of the substituents R.sub.1 to R.sub.4 is an organic thiol, sulfoxyl or sulfonyl group, and the other members R.sub.1 to R.sub.4 are H, F, Cl or Br, are reversible photochromic systems which can be used for contrast formation or light absorption.

Photochromic naphthacenequinones, process for their preparation and the

Compounds of the formula I or V, or mixtures thereof, ##STR1## wherein R is unsubstituted C.sub.6 -C.sub.14 aryl or C.sub.6 -C.sub.14 aryl which is substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, C.sub.1 -C.sub.12 alkylthio, phenyl, benzyl, --CN, --CF.sub.3, halogen or --COOR.sub.5, and R.sub.5 is H, C.sub.16 l-C.sub.18 alkyl, cyclohexyl, cyclopentyl, phenyl, C.sub.1 -C.sub.12 alkylphenyl, benzyl or C.sub.1 -C.sub.12 alkylbenzyl, and at least one of the substituents R.sub.1 to R.sub.4 is an organic thio, sulfoxyl or sulfonyl group, and the other members R.sub.1 to R.sub.4 are H, F, Cl or Br, are reversible photochromic systems which can be used for contrast formation or light absorption.

Compounds of formula I or V, or mixtures thereof, ##STR1## wherein R is unsubstituted C.sub.6 -C.sub.14 aryl or C.sub.6 -C.sub.14 aryl which is substituted by C.sub.1 -C.sub.12 alkyl, C.sub.1 -C.sub.12 alkoxy, C.sub.1 -C.sub.12 alkylthiol, phenyl, benzyl, --CN,--CF.sub.3, halogen or --COOR.sub.5, and R.sub.5 is H, C.sub.1 -C.sub.18 alkyl, cyclohexyl, cyclopentyl, phenyl, C.sub.1 -C.sub.12 alkylphenyl, benzyl or C.sub.1 -C.sub.12 alkylbenzyl, and at least one of the substituents R.sub.1 to R.sub.4 is an organic thiol, sulfoxyl or sulfonyl group, and the other members R.sub.1 to R.sub.4 are H, F, Cl or Br, are reversible photochromic systems which can be used for contrast formation or light absorption.

Compositions of a) thermosetting plastics or thermoplastics, and a mixture of such plastics, and b) a superconducting compound having a transition temperature T.sub.c of at least 20 K are suitable as moulding materials for the production of articles for magnetic screening of static magnetic fields and for transmitting of magnetic and electrical forces.

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Marly, Switzerland

Manfred Hofmann