Leybold Aktiengesellschaft

Dornier Gmbh

Inglas Gmbh & Co. Kg.

Manfred Arnold

Rainer Gegenwart

Jochen Ritter

Werner Scherber

Stefan Uhl

Helmut Stoll

Guido Blang

Michael Scherer

Peter Wirz

Klaus Michael

Andreas Leupolz

Gunter Abersfelder

Thomas Meisel

Sonja Noll

Oliver Burkhardt

Rudiger Braun

Gunther Abersfelder

Andreas Hartweg

Rüdiger Braun

A pane made of glass or plastic, whose optical degree of reflection can be controlled by switching between two different interference conditions. As a result, the transmissibility with respect to sun radiation can be reduced very efficiently and an excessive heating of glazed objects can be prevented. Preferred applications of the invention are the climate control of motor vehicles, rail vehicles, airplanes and buildings.

Reflectively controllable glazing

A transparent glass/plastic material composite pane, comprising at least one transparent plastic pane, at least one glass pane and according to demand an adhesion-promoting intermediate layer between the glass pane and the plastic pane, the glass pane being a glass film of a layer thickness of from 30 to 1,000 .mu.m.

Glazing

The invention relates to an arrangement for coating or etching substrates. In this arrangement an HF substrate bias voltage is generated without contact. For this purpose plasma sources are equipped with a bias pot which is disposed at the dark space distance from a substrate carrier and acted upon by HF. Depending on the source used, the bias pot can be constructed as an independent unit or as a component part of the source connected so as to be conducting-for example as an HF magnetron. Via this coupled-in HF power the dc potential on the carrier, and consequently the ion bombardment on the substrate, can be set specifically.

Arrangement for coating or etching substrates

The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.

Arrangement for coating substrates

A heated evaporator housing is provided at its inlet with an ultrasonic atomizer for reducing monomer to small droplets and a permeable porous body completely occupying a cross section of the housing between the inlet and the outlet. A vacuum pump and a reaction chamber for coating substrates are provided downstream of the outlet.

Apparatus for the evaporation of liquids

An apparatus for coating substrates in a vacuum chamber has a cathode system, which is preceded and followed by evacuable isolating chambers. The individual chambers can be separated from one another by locks, and the apparatus has a conduit leading into the coating chamber for feeding one or more process gases. Transport frames carry the substrates through the individual chambers on rails and/or wheels. In such an apparatus one or more bypass lines are provided which connect the coating chamber to the isolating chambers preceding or following it, and a shutoff or valve is inserted into each bypass line and brings about an equalization of pressure between the chambers. By means of a pressure equalization performed in this manner, the constancy of the gas concentrations which is essential in a reactive process to the stability of the process and to uniform coating properties, is automatically assured.

Apparatus for coating substrates

Growing community of inventors

Meckenbeuren, Germany

Manfred Arnold