Jx Metals Corporation

Jx Nippon Mining Metals Corporation

Jx Advanced Metals Corporation

Manami Masuda

Yasuyuki Iwabuchi

Masayoshi Shimizu

Takashi Kosho

Akira Shimojyuku

A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains NbOas a metal oxide component.

Sputtering target

Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.

Magnetic film and perpendicular magnetic recording medium

Provided is a sputtering target, comprising: from 0.001 mol % to 0.5 mol % of Bi; from 45 mol % or less of Cr; 45 mol % or less of Pt; 60 mol % or less of Ru; and a total of 1 mol % to 35 mol % of at least one metal oxide, the balance being Co and inevitable impurities.

Sputtering target and magnetic film

Provided is a sputtering target that can form a magnetic film having both good magnetic separation between magnetic grains and high coercive force at the same time; a magnetic film; and a method for producing a magnetic film. The sputtering target according to the present invention comprises: 1 at. % or more of Zn, a part or all of Zn forming a complex oxide(s) of Zn&#x2014;Ti&#x2014;O and/or Zn&#x2014;Si&#x2014;O; and 45 at. % or less of Pt, the balance being Co and inevitable impurities, the atomic percentage being based on an atomic ratio.

Sputtering target, magnetic film and method for producing magnetic film

Sputtering target, magnetic film, and perpendicular magnetic recording medium

Provided is a sputtering target containing 0.05 at % or more of Bi, and having a total content of metal oxides of from 10 vol % to 70 vol %, the balance containing at least Ru.

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Ibaraki, Japan

Manami Masuda