Panasonic Intellectual Property Management Co., Ltd.

Manabu Orita

Ryo Haseyama

Toshimi Nishiyama

Atsushi Ashino

A beam intensity uniformizing element includes an optical base, a first lens array disposed at a front surface of the optical base; and a second lens array disposed at a back surface of the optical base. The first lens array includes first mold lens cells arranged in different directions along the front surface of the optical base. The first mold lens cells have surfaces constituting the front surface of the optical base. The surfaces of the first mold lens cells have first linear marks thereon extending in a first direction. The second lens array includes second mold lens cells arranged in different directions along the back surface of the optical base. The second mold lens cells have surfaces constituting the back surface of the optical base. The surfaces of the second mold lens cells have second linear marks thereon extending in a second direction different from the first direction. This element suppresses generation of an interference pattern and reduces cost.

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Osaka, Japan

Manabu Orita