Samsung Electronics Co., Ltd.

Man-hyoung Ryoo

Jung-hwan Hah

Sang-jun Choi

Kyoung-seon Kim

Sung-min Chi

Won-Sun Kim

Mitsuhiro Hata

Sang-Gyun Woo

Moon-Sook Lee

Han-Ku Cho

Byeong-Ok Cho

Takahiro Yasue

Sun-Ok Jung

Song-Jun Choi

An oligomer probe array having improved reaction yield is provided. The oligomer probe array includes a substrate, an immobilization layer on the substrate, a plurality of nano particles coupled with a surface of the immobilization layer, and a plurality of oligomer probes coupled with surfaces of the nano particles.

Oligomer probe array and method of producing the same

A photolabile compound, an oligomer probe array, and a substrate for oligomer probe array comprising the same, and a manufacturing method of the same are disclosed.

Photolabile compound, oligomer probe array and substrate for oligomer probe array containing the same, and manufacturing method of the same

Example embodiments relate to a biosensor using a nanoscale material as a channel of a transistor and a method of fabricating the same. A biosensor according to example embodiments may include a plurality of insulating films. A first signal line and a second signal line may be interposed between the plurality of insulating films. A semiconductor nanostructure may be disposed on the plurality of insulating films, the semiconductor nanostructure having a first side electrically connected to the first signal line and a second side electrically connected to the second signal line. A plurality of probes may be coupled to the semiconductor nanostructure. A biosensor according to example embodiments may have a reduced analysis time.

Biosensor using nanoscale material as transistor channel and method of fabricating the same

A microarray, a substrate for a microarray and more productive methods of fabricating the microarray and the substrate are provided. The microarray includes a substrate divided into a first region and a second region; a plurality of linkers represented by formula 1 or 2: 

Microarray, substrate for microarray and methods of fabricating the same

A non-linear silicon compound is provided. The non-linear silicon compound may be a non-linear aromatic compound used as a linker for manufacturing an oligomer probe array. The non-linear silicon compound may reduce self-aggregation so as to form a stable and uniform monolayer. As a result, upon hybridization analysis, the fluorescent intensity may be increased.

Non-linear silicon compound, method of manufacturing oligomer probe array using the same, substrate for oligomer probe array with the same, and oligomer probe array with the same

A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.

Polymer, top coating layer, top coating composition and immersion lithography process using the same

Provided is a substrate for an oligomer probe array to which a photolabile material having an acetylene derivative is directly attached or attached via a linker.

Photolabile compound and substrate for oligomer probe array with the same

Provided are a barrier coating composition and a method of forming photoresist pattern by an immersion photolithography process using the same. The barrier coating composition includes a polymer corresponding to formula I having a weight average molecular weight (Mw) of 5,000 to 100,000 daltons and an organic solvent, wherein the expressions 1+m+n=1; 0.1&#x2266;1/(1+m+n)&#x2266;0.7; 0.3&#x2266;m/(1+m+n)&#x2266;0.9; and 0.0&#x2266;n/(1+m+n)&#x2266;0.6 are satisfied; Rf is a Cto Cfluorine-substituted hydrocarbon group; and Z, if present, includes at least one hydrophilic group. Compositions according to the invention may be used to form barrier layers on photoresist layers to suppress dissolution of photoresist components during immersion photolithography while allowing the barrier layer to be removed by alkaline developing solutions.

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Hwaseong-si, South Korea

Man-hyoung Ryoo