Samsung Electronics Co., Ltd.

Dongjin Semichem Co., Ltd.

Man-Ho Han

Hyun-Jin Kim

Jae-Hyun Kim

Tae-Yong Kim

Yool Kang

Sung-Su Kim

Jung-Youl Lee

Kyung-Lyul Moon

Jin-A Ryu

Hyo-Jung Roh

Dong-Kyu Ju

Yu-Jin Jeoung

A method of forming a pattern is disclosed. The method includes preparing a composition that includes a solvent and a polymer including a repeating unit in which at least one isocyanurate unit having a first structure is connected to another isocyanurate unit having a second structure different from the first structure; applying the composition on a substrate to form an underlayer; forming a photoresist layer on the underlayer; etching the photoresist layer to form a photoresist pattern; and patterning the substrate using the photoresist pattern.

Methods of forming patterns using compositions for an underlayer of photoresist

An apparatus and method for detecting a mode change in an electronic device are provided. The apparatus includes a rotary switch including a common port and a plurality of contact points corresponding to a plurality of modes, a comparator for comparing a voltage of the common port with a reference voltage to output a resultant signal, a measurement unit for measuring the voltage of the common port according to the resultant signal of the comparator, and a Micro Control Unit (MCU) for evaluating a changed mode based on the measured voltage.

Apparatus and method for detecting mode change in an electronic device

A polymer for forming an organic anti-reflective coating layer, which is soluble in alkali solutions so that an additional etching process of anti-reflective coating layer is not required, and a composition including the same are disclosed. The polymer for forming an organic anti-reflective coating layer has the following formula.  Wherein, Ris a hydrogen atom (H) or a methyl group (&#x2014;CH), Ris a sulfur atom (S) or an oxygen atom (O), Ris a group containing 1 to 20 carbon atoms and a terminal hydroxyl group, Ris an alkylene group or a cycloalkylene group, and if necessary, a hetero atom is contained therein, and a, b and c independently represent weight % of repeating units constituting the polymer, and are 1 to 98 weight %, 1 to 98 weight %, and 1 to 98 weight %, respectively.

Polymer for forming organic anti-reflective coating layer

Growing community of inventors

Hwaseong-si, South Korea

Man-Ho Han