Tanaka Chemical Corporation

Kanto Gakuin University Surface Engineering Research Institute

Mamoru Shimakawa

Takeshi Usui

Toyoshi Iida

Hiroyuki Ito

Hideo Honma

Taiji Nishiwaki

The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.

High density cobalt-manganese coprecipitated nickel hydroxide and process for its production

A process for production of nickel oxyhydroxide by electrolytic oxidation of nickel hydroxide in the presence of an alkali metal halide. The nickel oxyhydroxide is produced by adding nickel hydroxide particles to an aqueous solution of an alkali metal halide and stirring the mixture to prepare a nickel hydroxide slurry, and then converting a portion of the nickel hydroxide to nickel oxyhydroxide by electrolytic oxidation in the presence of the alkali metal halide.

Process for producing nickel oxyhydroxide by electrolytic oxidation

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Fukui, Japan

Mamoru Shimakawa