Konishiroku Photo Industry Co., Ltd.

Mamoru Komiya

Masaru Kanbe

Eiichi Sakamoto

Sadatugu Terada

Masao Ishihara

Naoto Abe

Hiroshi Yamada

Kenichi Kitahara

Kazuo Nakazato

Motoo Kogure

Masaharu Oishi

A photographic light-sensitive material comprising a layer which contains a compound represented by the following Formula I ##STR1## wherein R.sub.1 is an alkyl group having 1 to 18 carbon atoms, R.sub.2 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms with a proviso that when R.sub.2 is a hydrogen atom, R.sub.1 is an alkyl group having 1 to 7 carbon atoms, M is a cation and n is a number of 1 to 50.

Photographic light-sensitive material

This invention provides an undercoat-applied plastic film comprising a plastic film substrate and an undercoat layer on at least one surface of the plastic film substrate, said undercoat layer being formed by treating the film surface with a soluble high molecule compound expressed by the following general formula: ##STR1## AND A SOLVENT OR SWELLING AGENT FOR SAID PLASTIC FILM SUBSTRATE. This undercoat-applied aplastic film has an excellent antistatic property on the treated surface and exhibits a good adherence to a material to be applied thereto.

Undercoat-applied plastic films

Growing community of inventors

Sagamihara, Japan

Mamoru Komiya