Samsung Electronics Co., Ltd.

Mamikon Aramovich Misakyan

Young-dong Lee

Igor Antonovich Kossyi

Merab Ivanovich Taktakishvili

A microwave resonance plasma generating apparatus, a plasma processing system having the same and a method of generating a microwave resonance plasma are provided. The apparatus includes a microwave generating unit which generates a microwave, and a plasma producing unit which produces electrons and photons of high energy using the microwave generated from the microwave generating unit. The plasma producing unit includes a coaxial waveguide having an inner electrode disposed adjacent to the microwave generating unit, an outer electrode connected to the microwave generating unit and disposed to coaxially surround a portion of the inner electrode, the outer electrode being shorter than the inner electrode, and a dielectric tube disposed between the inner electrode and the outer electrode to insulate between the inner electrode and the outer electrode. The coaxial waveguide utilizes a principle of 'cut or truncated electrode of coaxial waveguide' and a resonance phenomenon of Langmiur.

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Moscow, Russia

Mamikon Aramovich Misakyan