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Oerlikon Surface Solutions Ag, Pfaffikon

Oerlikon Metco Ag

Forschungszentrum Julich Gmbh

Oerlikon Metco Ag, Wohlen

Sulzer Metco Ag

Malko Gindrat

Rajiv J Damani

Jürgen Ramm

Beno Widrig

Peter Polcik

Robert Vassen

Richard Karl Schmid

Detlev Stöver

Christoph Hollenstein

Philippe Guittienne

Alexander Barth

Georg Mauer

Karl-Heinz Rauwald

Andreas Hospach

Konstantin Von Niessen

Jochen Häring

Dario Russo

Jochen Haering

Plasma nozzle includes a nozzle body arranged to engage with a thermal spray gun. The nozzle body includes an axial through bore having up-stream input orifice and a down-stream nozzle exit, at least one material injector positioned between the up-stream input orifice and the nozzle-exit, said at least one material injector being configured to introduce a feedstock material into a gas flow passing through the axial through bore and at least one gas injector configured to introduce a shroud gas flow into the axial through bore and being located at a position up-stream of said at least one material injector.

Plasma nozzle for a thermal spray gun and method of making and utilizing the same

A superalloy workpiece includes a superalloy substrate and an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate. A transition layer (TL) of essentially the same superalloy and superalloy oxides or a different metal composition and different metal oxides is on the interface layer (IF-1). The oxygen content of the transition layer increases from the interface layer (IF-1) towards a barrier layer (IF-2) of super alloy oxides or of different metal oxides.

PVD bond coat

A layered stack that can be used as an oxidation and chemical barrier with superalloy substrates, including Ni, Ni&#x2014;Co, Co, and Ni-aluminide based substrates, and methods of preparing the layered stack. The layer system can be applied to a substrate in a single physical vapor deposition process with no interruption of vacuum conditions.

PVD barrier coating for superalloy substrates

A plasma spray method for the manufacture of an ion conducting membrane, in particular of a hydrogen ion conducting membrane or of an oxygen ion conducting membrane. In the method, the membrane is deposited as a layer on a substrate in a process chamber, wherein a starting material is sprayed onto a surface of the substrate by means of a process gas in the form of a process beam. The starting material is injected into a plasma at a low process pressure which is at most 10000 Pa and is partially or completely melted there. In accordance with the invention, the substrate has pores which are connected amongst one another so that the substrate is gas permeable and a portion of an overall pore area of an overall area of the coating surface amounts to at least 30% or, in a particular embodiment, to at least 40%.

Plasma spray method for the manufacture of an ion conducting membrane and an ion conducting membrane

To apply a thermal barrier coating (), a plasma jet () is generated by a plasma torch in a work chamber () and is directed to the surface of a substrate () introduced into the work chamber, and a ceramic coating material is applied to the substrate surface by means of PS-PVD, wherein the coating material is injected into the plasma jet as a powder and is partly or completely vaporized there. On applying the thermal barrier coating, in a first workstep the feed rate of the injected powder is set so that a large part of the injected powder vaporizes, wherein the coating material condenses from the vapor phase on the substrate surface and forms mixed phases with the material of the substrate surface. In a second workstep, the feed rate of the injected powder it increased by at least a factor of 5, whereby the portion of the powder which vaporizes is reduced and the coating material is deposited in the form of elongate columns which form an anisotropic microstructure and which are aligned substantially perpendicular to the substrate surface.

Method of applying a thermal barrier coating

A plasma spray method for the manufacture of an ion conductive membrane is provided which ion conductive membrane has an ion conductivity, in which method the membrane is deposited as a layer () onto a substrate () in a process chamber, wherein a starting material (P) is sprayed onto a surface of the substrate () in the form of a process beam () by means of a process gas (G), wherein the starting material is injected into a plasma at a low process pressure, which is at most 10,000 Pa, and is partially or completely molten there. Oxygen (O) is supplied to the process chamber () during the spraying at a flow rate which amounts to at least 1%, preferably at least 2%, of the overall flow rate of the process gas.

Plasma spray method for the manufacture of an ion conductive membrane

A method for the coating of a substrate in which a starting material (P) is sprayed onto the substrate in the form of a process jet by means of plasma spraying, with the starting material (P) being injected into a plasma which defocuses the process jet and being melted partly or completely into a liquid phase there at a low process pressure which is at most 20,000 Pa, wherein a gas flow for the process jet is set such that the substrate is coated by deposition from the liquid phase in at least one region which is located in the geometric shadow with respect to the process jet.

Method for coating a substrate and substrate with a coating

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Wohlen, Switzerland

Malko Gindrat