Renesas Electronics Corporation

Nec Corporation

Makoto Ueki

Yoshihiro Hayashi

Naoya Inoue

Takashi Hase

Takahiro Onodera

Koji Masuzaki

Munehiro Tada

Daisuke Oshida

Takashi Oyamada

Manabu Iguchi

Takuya Maruyama

Naoya Furutake

Nobuyuki Ikarashi

Ippei Kume

Mari Amano

Toshiji Taiji

Masaharu Matsudaira

Masayoshi Tagami

Masayuki Hiroi

Hirokazu Katsuyama

A resistance change element includes first and second electrodes spaced apart from each other, a metal material layer adjacent to the first electrode, an oxide layer adjacent to each of the metal material layer and the first electrode, and a resistance change layer disposed continuously between the second and first electrodes and between the second electrode and the oxide layer. The resistance change layer is made of a metal oxide. The metal material layer is made of a metal or a metal compound. The oxide layer is made of an oxide of the material forming the metal material layer. The first electrode is made of ruthenium, ruthenium oxide, iridium, iridium oxide, platinum, gold, or copper. A free energy of oxide formation of the oxide forming the oxide layer is higher than a free energy of oxide formation of the oxide forming the resistance change layer.

Resistance change memory device

A semiconductor device has a resistance change element that is high in the holding resistance of a low resistance (On) state while securing a memory window. In a resistance random access memory including selection transistors and resistance change elements coupled in series to the selection transistors, the resistance change element uses a lower electrode that applies a positive voltage when being transited to a high resistance (Off) state, an upper electrode that faces the lower electrode, and a resistance change layer that is sandwiched between the lower electrode and the upper electrode and that uses an oxide of transition metal. The resistance change layer contains nitrogen. The concentration of nitrogen on the lower electrode side is higher than that on the upper electrode side. The nitrogen in the resistance change layer exhibits a concentration gradient continuously declined from the lower electrode side to the upper electrode side.

Semiconductor device and manufacturing method thereof

Included are memory cells each including a resistance change element and a control circuit. The circuit performs an On writing process for applying, to the memory cell, an On writing pulse for the cell to be in a resistance state where a resistance value of the resistance change element is lower than a first reference value and an Off writing process for applying an Off writing pulse with an opposite polarity to the On writing pulse for a high resistance state with a second reference value or greater. The circuit applies, in the On writing process, a trial pulse having the same polarity as that of the On writing pulse and having the pulse width shorter than that of the On writing pulse and a reset pulse having the same polarity as that of the On writing pulse, in this order before applying the On writing pulse to the cell.

Semiconductor memory device including a resistance change element and a control circuit for changing resistance of the resistance change element

To improve information retention resistance of a resistance change memory which requires high information retention resistance. On the assumption that a special data storage memory and a general-purpose data storage memory are distinguished from each other, a forming operation small in resistance rise rate is used for an information writing operation of the special data storage memory. A switching operation is used for information writing of the general-purpose data storage memory. That is, the special data storage memory is configured so as to store information while adapting an initial resistance state to '0' whereas adapting a low resistance state to '1'. On the other hand, the general-purpose data storage memory is configured so as to store information while adapting a high resistance state to &#x201c;0&#x201d; whereas adapting a low resistance state to &#x201c;1&#x201d;.

Semiconductor device and operating method thereof

The semiconductor device includes an insulating film that is formed using a cyclic siloxane having a six-membered ring structure as a raw material; a trench that is formed in the insulating film; and a interconnect that is configured by a metal film embedded in the trench. In the semiconductor device, a modified layer is formed on a bottom surface of the trench, in which the number of carbon atoms and/or the number of nitrogen atoms per unit volume is larger than that inside the insulating film.

Method of manufacturing semiconductor device

A semiconductor integrated circuit includes a logic circuit having a plurality of operation modes, a power source circuit that generates a power source voltage to be supplied to the logic circuit, a power source wiring that couples the power source circuit and the logic circuit, and a charge control block that holds charges for controlling the voltage of the power source wiring. The power source circuit generates a first power source voltage for causing the logic circuit to operate in a computing mode and a second power source voltage for causing the logic circuit to operate in a sleep mode. The charge control block includes a capacitor, a first switch, and a voltage supply unit that supplies the second power source voltage or a third power source voltage lower than the second power source voltage, to the capacitor.

Semiconductor integrated circuit and method of reducing power consumption

A semiconductor device in which MRAM is formed in a wiring layer A contained in a multilayered wiring layer, the MRAM having at least two first magnetization pinning layers in contact with a first wiring formed in a wiring layer and insulated from each other, a free magnetization layer overlapping the two first magnetization pinning layers in a plan view, and connected with the first magnetization pinning layers, a non-magnetic layer situated over the free magnetization layer, and a second magnetization pinning layer situated over the non-magnetic layer.

Semiconductor device and method of manufacturing the semiconductor device

Provided is a semiconductor device, which includes an interlayer insulating film formed on a semiconductor substrate, a wiring layer filled in a recess formed in the interlayer insulating film, and a cap insulating film. The interlayer insulating film includes a first SiOCH film and a surface modification layer including an SiOCH film formed by modifying a surface layer of the first SiOCH film, the SiOCH film having a lower carbon concentration and a higher oxygen concentration than the first SiOCH film has. The cap insulating film contacts with surfaces of the metal wiring and the surface modification layer.

Semiconductor device having insulating film with surface modification layer and method for manufacturing the same

A semiconductor device has a multilayer interconnection including a copper interconnection film formed in a predetermined area within an insulating film, a liner film, and a high-melting-point metal film. The copper interconnection film is polycrystalline, and crystal grains occupying 40% or more of an area of a unit interconnection surface among crystal grains forming the polycrystal are oriented to (111) in a substrate thickness direction. The copper interconnection film has crystal conformity with the noble metal liner film. In a case where the high-melting-point metal film is formed of Ti and the noble metal liner film is a Ru film, the high-melting-point metal of Ti dissolves into Ru in a solid state to form the noble metal liner. Thus, a copper interconnection is formed with both of Cu diffusion barrier characteristics and Cu crystal conformity.

Semiconductor device and method of manufacturing the same

A wiring metal contains a polycrystal of copper (Cu) as a primary element and an additional element other than Cu, and concentration of the additional element is, at crystal grain boundaries composing the Cu polycrystal and in vicinities of the crystal grain boundaries, higher than that of the inside of the crystal grains. The additional element is preferably at least one element selected from a group consisting of Ti, Zr, Hf, Cr, Co, Al, Sn, Ni, Mg, and Ag. This Cu wiring is formed by forming a Cu polycrystalline film, forming an additional element layer on this Cu film, and diffusing this additional element from the additional element layer into the Cu film. This copper alloy for wiring is preferred as metal wiring formed for a semiconductor device.

Copper alloy for wiring, semiconductor device, method for forming wiring and method for manufacturing semiconductor device

A water-proof modular connector includes a plug socket to be fixed to an object, and a plug detachably coupled to the plug socket. The plug socket includes a plug socket body having first and second socket-openings directing outwardly and inwardly of the object, respectively, a modular jack unit having first and second jack-openings directed in opposite directions to each other, and a holder which holds the modular jack in the plug socket body such that the first and second jack-openings are directed to the first and second socket-openings, respectively. The plug includes a plug body through which a communication cable passes, a modular plug connected to the communication cable, a first positioning unit which positions the modular plug in the plug body, a cap which detachably couples the plug body to the plug socket body such that the modular plug is inserted into the first socket-opening, and a water-proof unit ensuring water-proof between the plug socket body and the plug body.

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Tokyo, Japan

Makoto Ueki