Nippon Kogaku K.k.

Nikon Corporation

Mejiro 67 Inc.

Chugai Seiyaku Kabushiki Kaisha

Makoto Uehara

Koichi Matsumoto

Kiyoyuki Muramatsu

Akikazu Tanimoto

Yutaka Suenaga

Kyoichi Suwa

Shigeru Kato

Satoru Anzai

Hajime Ichikawa

Masahiko Yomoto

Shuhei Takagi

Kenji Nishi

Satoshi Watanabe

Hideo Mizutani

Kazuaki Suzuki

Susumu Mori

Toshio Matsuura

Yukio Kakizaki

Masato Shibuya

Kazumasa Endo

Seiro Murakami

Hidemi Kawai

Tetsuo Kikuchi

Satoshi Mogami

Kaname Tsuzaki

Fujio Kanatani

Tetsuhiro Mikami

Takeshi Sudo

Kouhei Nakamura

Tadao Michishita

Masahiro Katoh

Sumio Hashimoto

Koji Oikawa

Takeshi Asami

Provided is an imaging lens consisting of a front-group imaging lens having a plurality of lenses in front and behind a diaphragm, and a convex-concave Galilean system composed of a convex lens on the front group side and a concave lens on the imaging plane side, the imaging lens performing focusing by fixing the convex-concave Galileo system near the imaging plane and extending the front-group imaging lens, wherein the surface on the imaging plane side of the lens at the end of the Galileo system on the imaging plane side is a flat surface, and the flat surface is in contact with the end of an image sensor on the imaging lens side, or the front-group imaging lens is a four-group, six-element Gauss lens, a four-group, seven-element Summitar lens, or a five-group, seven-element modified Summitar lens obtained by separating a Summitar front-lens-element doublet lens.

Imaging lens

An imaging lens includes a focusing lens assembly with a positive refractive power, which can move in a direction of an optical axis depending on an object distance and have two positive lens groups with an aperture disposed therebetween, and a fixed lens assembly with a negative refractive power fixed near the imaging plane. The focusing lens assembly includes a 2-division-3-piece front group with positive refractive power consisting of single lens and doublet lenses, the aperture, and a 2-division-3-piece back group with positive refractive power consisting of doublet lenses and single lens. The focusing lens closest to the object side is a meniscus lens convex at the object side and concave at an image side and has the weakest refractive power out of all. The front group and the back group relative to the aperture have focal lengths f1 and f2 complying with correlation of 0.9<f1/f2<1.3.

Image forming lens

A process for preparing a vitamin D derivative including providing an ultraviolet irradiation apparatus for photochemical reactions, which has an ultraviolet radiation-emitting lamp, an optical system which receives light from the ultraviolet radiation-emitting lamp and emits ultraviolet rays having a specific wavelength, and a quartz rod which receives the ultraviolet rays having the specific wavelength from the optical system and emits the ultraviolet rays, irradiating a solution of a provitamin D derivative with the ultraviolet rays emitted from the quartz rod to cause a photochemical reaction to the provitamin D derivative solution, thereby forming a previtamin D derivative, and subjecting the previtamin D derivative to a thermal isomerization reaction to prepare the vitamin D derivative.

Ultraviolet irradiation apparatus for photochemical reaction and preparation process of vitamin D derivative making use of the same

An apparatus and a method for detecting the temperature of a substrate, and for controlling the radiation-annealing of the substrate, for example, measures the intensity of infrared light from the substrate when the substrate is irradiated by measuring infrared light and also when the substrate is not irradiated by the infrared light. The temperature is calculated from the transmissivity and emissivity of the substrate, which are calculated from the intensity measurements.

Method for measuring temperature of semiconductor substrate and

An apparatus for annealing a substrate includes a plurality of annular light sources concentric about a predetermined axis, a holder for placing the substrate such that the substrate receives radiation from the plurality of annular light sources and is substantially perpendicular to the predetermined axis, and a measuring device having a measuring optical system with an optical axis substantially aligned with the predetermined axis. The measuring device is adapted to receive radiation through the measuring optical system from the substrate placed on the holder and to detect a temperature distribution of the substrate.

Light radiation apparatus

A projection exposure apparatus has a pattern lighting optical system including an exposure light source for lighting a pattern on a photomask, a projection optical system for forming an image of the pattern lighted by the exposure light source on the surface of a wafer, an alignment lighting optical system including an alignment light source for lighting alignment marks on the photomask and the wafer, and an alignment optical system for detecting relative positional relationship between the mask pattern and the wafer through the projection optical system, and further the projection optical system includes an image-forming system which exhibits two extremums of axial aberration as a function of wavelength.

Multi-wavelength projection exposure and alignment apparatus

A projection type exposure apparatus for projecting an image of a pattern formed on a reticle onto a wafer in which the exposure is carried out with first light and the alignment between reticle and wafer is carried out with a second light having a wavelength different from that of the first light. The apparatus includes an optical member disposed between alignment optical system and projection optical system for reflecting the first light and transmitting the second light.

Projection type exposure apparatus

An optical apparatus comprising a laser light source, an optical system for focusing a beam of light from the laser light source onto an object surface through an objective lens and a spatial filter disposed at the entrance pupil of the objective lens or at a position conjugated with the entrance pupil, wherein the origin of the divergence of the laser beam having an angle of divergence emitted from the laser light source is projected on the entrance pupil of the objective lens by the optical system.

Optical apparatus for detecting the position of an object

The projection optical apparatus includes light-emitting means which are disposed on a stage movable along the image plane in the projection optical apparatus and which define a light-emitting plane having a predetermined shape; photoelectric detection means which is disposed at a position substantially in conjugate relationship with a pupil of said projection optical apparatus and which receives the light emitted from the light-emitting plane of the light-emitting means through the projection optical system and a mask in which a pattern is defined at a predetermined position; and position detection means which controls the stage in such a way that the image projected on the light-emitting plane is shifted in relation to the mask pattern and which detects the superposed position between the image and the pattern in response to the light signal derived from the photoelectric detection means while the projected image is shifted and to the position of the stage.

Projection optical apparatus for mask to substrate alignment

An illumination optical system comprises a multi-beam generator which includes a plurality of each of two kinds of lens elements different in optical characteristics and which is interposed between a source for generating a collimated light beam and a light condenser. The multi-beam generator generates a large number of secondary light sources from the collimated light beam. The illumination optical system is capable of supplying illuminating light rays having an extremely uniform illumination distribution.

Illumination optical system

A projection optical apparatus comprises illuminating means providing for an illuminating light beam, a projection optical system including optical elements disposed across the illuminating light beam and having an imaging plane, and detecting mean including temperature sensor means provided on at least one of the optical elements and producing an output corresponding to the temperature of the one optical element.

Projection optical apparatus

An optical path length compensating device comprises a first objective having one focus coincident with a two-dimensional plane and provided for movement along the two-dimensional plane, a second objective having one focus coincident with a predetermined focal plane, first and second reflecting means provided in the optical path between the first objective and the second objective for movement along the optical path, the first reflecting means including at least one reflecting surface for turning the optical path from the first objective by a predetermined angle in a plane parallel to the two-dimensional plane, the second reflecting means including at least one pair of reflecting surfaces for directing the light from the first reflecting means to the second objective, means for moving the first objective and the first reflecting means in operative association with each other, and means for moving the second reflecting means so that the other focus of the first objective and the other focus of the second objective are coincident with each other.

Optical path length compensating optical system in an alignment apparatus

A position alignment apparatus aligns a photosensitive substrate and a mask (projection image) at high speed and with high precision. The apparatus has a projection optical system for projecting a pattern image on a mask or reticle onto a photosensitive substrate, a detector for detecting a two-dimensional misalignment of a projected pattern image and a wafer, and means for moving the wafer along orthogonal x- and y-axis directions and for rotating the wafer along a rotational direction within a plane defined by the x- and y-axis directions so as to eliminate the misalignment, wherein the detector has first detecting means with an optical system for detecting at least a misalignment of the wafer along the x-axis direction through the projection lens, and second detecting means with an optical system separate from the projection lens and for detecting at least a misalignment of the wafer along a rotational direction.

Alignment apparatus

A mirror converging-type illumination optical system for converging light rays from a light source into substantially parallel light rays using a concave reflecting mirror having a secondary curved surface comprises a conical refraction member having a convex conical refraction surface at an input or incident side thereof and another convex conical refraction surface at an output side thereof. The refraction member is arranged in a path of the parallel light rays with a vertex of the conical refraction member being substantially aligned with the optical axis of the illumination optical system. The refraction member inverts the inner and outer portions of the incident parallel light rays. The absence of incident parallel light around the optical axis thereof is corrected to achieve a uniform intensity of light rays.

Mirror converging-type illumination optical system

An illumination optical arrangement comprises light source means emitting a coherent light beam, and means for forming a substantially incoherent light source from the coherent light beam. The incoherent light source forming means includes means for periodically deflecting the coherent light beam and scanning a predetermined scanning area by the coherent light beam, and optical means for forming a plurality of optical paths for directing the coherent light beam passed through the predetermined scanning area to a plurality of different secondary scanning areas. Each of the plurality of secondary scanning areas is scanned by the periodically deflected coherent light beam.

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Tokyo, Japan

Makoto Uehara