Kabushiki Kaisha Topcon

Kabushiki Kaisha Toshiba

Nuflare Technology, Inc.

Topcon Corporation

Makoto Taya

Susumu Saito

Hiroshi Koizumi

Toru Tojo

Akio Kobayashi

Mitsuo Tabata

Kazuo Abe

Michiko Nakanishi

Yumi Takahashi

Toshiyuki Watanabe

Nobutaka Kikuiri

Hisakazu Yoshino

Eiji Yamanaka

Kyoji Yamashita

Kiminobu Akeno

Yasushi Sanada

Tomohide Watanabe

Hideo Nagai

Akemi Miwa

Noboru Kobayashi

Chikara Itoh

An inspection apparatus comprising, a light source configured to emit an inspection light, a table configured to mount an inspection target thereon, an illumination optical system configured to direct the inspection light from the light source toward the target, an objective lens unit configured to gather transmitting or reflected light generated after the illumination optical system illuminates the target with the inspection light, a light receiving unit configured to capture an optical image formed from the light illuminated through the objective lens unit, a chamber configured to house the table, light receiving unit, illumination optical system and objective lens unit, a temperature adjustment unit configured to adjust a temperature in the chamber, and a gas supply unit configured to be connected to the objective lens unit to supply an inert gas at a predetermined temperature into the unit.

Inspection apparatus

In a lens periphery edge processing apparatus comprising lens rotating shafts for putting and holding an objective lens therebetween, a carriage rotatable around a pivot, and a grindstone rotating shaft provided with a grindstone for grinding the objective lens L, the lens rotating shaft is provided with a reference globe having a predetermined radius.

Lens periphery edge processing apparatus

In a lens periphery edge processing apparatus comprising lens rotating shafts 16, 17 for putting and holding an objective lens therebetween, a carriage 15 rotatable around a pivot, and a grindstone rotating shaft 9 provided with a grindstone 5 for grinding the objective lens L, the lens rotating shaft 17 is provided with a reference globe 70 having a predetermined radius.

A single light emitted from a laser source is split into multiple beams. The multiple beams are illuminated by a multi-beam scanner to scan a substrate of interest. An optical system is provided for focusing the multiple beams independently on the substrate and directing a reflected light or a transmitted light of the multiple beams on the substrate. Aperture regulating members are disposed at equal intervals corresponding to the interval between the multiple beams for controlling the multiple beams directed from the substrate by the optical system. The multiple beams passed through their respective aperture regulating members are received by an optical detector assembly which detect a change in the amount of the multiple beams. The substrate is continuously moved by a movable table on a plane substantially vertical to the multiple beams and in a direction arranged at substantially a right angle to the scanning direction of the multiple beams. Then, a scanned image is produced by an image processor from a signal output of the detector assembly and data of the coordinate location of the movable table and compared by a comparator with a corresponding reference image.

Optical substrate inspection apparatus

The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

Pattern evaluation apparatus and a method of pattern evaluation

Growing community of inventors

Tokyo, Japan

Makoto Taya