Sony Corporation

Canon Kabushiki Kaisha

Casio Computer Co., Ltd.

Other

Asahi Kogaku Kogyo Kabushiki Kaisha

Mitsubishi Denki Kabushiki Kaisha

Tdk Corporation

Sony Electronics Inc

Kabushiki Kaisha Toshiba

Micron Technology Incorporated

Mitsubishi Heavy Industries Limited

Matsushita Electric Industrial Co., Ltd.

Renesas Electronics Corporation

Olympus Optical Company, Ltd.

Sony Group Corporation

Makoto Sato

Yoshihiko Iwase

Hiroyuki Shinbata

Hisato Shima

Tomoyuki Makihira

Kazuhide Miyata

Ritsuya Tomita

Daisuke Kibe

Tatsuya Asahata

Takuro Noda

Yoshio Osakabe

Mari Horiguchi

Tomoyuki Asano

Yoshitomo Osawa

Ryuji Ishiguro

Harumi Kawamura

Kazuhiro Suzuki

Osamu Tsujii

Satoshi Kobayashi

Yuji Kimura

Atsushi Uemoto

Naoyuki Sato

Satoshi Tomimatsu

Hiroshi Kajiwara

Takashi Ogura

Takehiko Nakano

Masahiko Okunuki

Hiraku Inoue

Yo Yamamoto

Ichiro Hamada

Ichiro Sakamoto

Kazuro Yamada

Hiroki Kishi

Takahiro Fujimori

Satoshi Shimizu

Masato Suzuki

Yukio Sakagawa

Kenji Tomizawa

Tatsuya Igarashi

Masahiko Sato

Naofumi Yanagihara

Atsushi Yamaguchi

Yoshihito Hirano

Shinichi Takagi

Nobuhiro Tomatsu

Kazushi Yoshida

Hiroshi Kakuda

Xin Man

Yoshiyuki Takaku

Kazuyuki Yamamoto

Akihiro Katayama

Seiji Suzuki

Makoto Takemura

Nobuhito Suehira

Norifumi Kikkawa

Masatomo Kurata

Hiroki Uchida

Mitsuro Sugita

Osamu Sagano

Hidekazu Suzuki

Shigeyuki Uzawa

QiHong Wang

Kenji Muto

Makoto Morishima

Hisashi Namba

Yasuyuki Numajiri

Hiroyuki Yamamoto

Tomoo Mitsunaga

Jun Yonemitsu

Masao Imai

Hiroshi Imamura

Kenzo Makino

Tomoya Narita

Ryota Ogawa

Hiroshi Ishikawa

Akira Maeda

Daisuke Mochizuki

Kiyoshi Noguchi

Koichi Sugiyama

Kentaro Ida

Masahiro Kiyohara

Hiroshi Ogino

Yasuyuki Tejima

Masahiro Ogawa

Yuji Suzuki

Kenji Fujita

Yu Tanaka

Masashi Sano

Takashi Ogata

Tsukasa Sako

Kenji Honda

Tsutomu Utagawa

Koji Nishimura

Tomonori Sato

Koji Takekoshi

Hiromichi Umehara

Kensei Jo

Toshio Oka

Takashi Sasai

Katsumi Otsuka

An authentication device includes a deciding unit that, based on distribution information of the feature points included in a pattern present in some part of the body of the user, decides on the position of that part of the body to be used in authentication of the user. The authentication device further includes a guiding unit that, based on the decided position, guides the concerned part of the body to the decided position for the purpose of authentication of the user. The authentication device further includes an authenticating unit that performs authentication of the user based on feature information of the pattern as obtained due to the guiding.

Authentication device and recognition method

An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

Automatic sample preparation apparatus

The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

Charged particle beam irradiation apparatus and control method

An information processor including a sensor unit that recognizes an operating tool that comes into contact with a display unit, and a control unit that shows a guidance display for guiding an operation of the operating tool on the display unit.

Information processor, information processing method, program, and wearable device

Outboard motor

The particle beam irradiation apparatus includes: an irradiation unit configured to radiate a particle beam; a first detection unit configured to detect first particles; a second detection unit configured to detect second particles; an image forming unit configured to form an observation image based on a first signal obtained by the detection of the first particles, which is performed by the first detection unit, and to form an observation image based on a second signal obtained by the detection of the second particles, which is performed by the second detection unit; and a control unit configured to calculate a brightness of a first region in the formed first observation image and perform a brightness adjustment of the first detection unit based on a first target brightness as a first brightness adjustment when the brightness of the first region is different from the first target brightness.

Particle beam irradiation apparatus

In a force sense presenting apparatus having a right-hand force sense presenting unit and a left-hand force sense presenting unit, one side of an upper frame of the right-hand force sense presenting unit is linearly coupled to the one side of the upper frame of the left-hand force sense presenting unit. A right-hand rear-coupled frame couples an approximately middle location of the upper frame in the right-hand force sense presenting unit to one side of a lower frame in the right-hand force sense presenting unit so that the upper frame and the lower frame are approximately T-shaped viewed from above. A left-hand rear-coupled frame couples an approximately middle location of the upper frame in the left-hand force sense presenting unit to the one side of the lower frame in the left-hand force sense presenting unit so that the upper frame and the lower frame are approximately T-shaped viewed from above.

Force sense presenting apparatus

A stimulating section applies stimulation to a living body. A first lead electrode and a second lead electrode are attached on the living body. A first amplifier circuit amplifies potential difference that is evoked between the first lead electrode and the second lead electrode due to the stimulation. A first switch cancels electrical connection between the first amplifier circuit and each of the first lead electrode and the second lead electrode at least while the stimulation is applied. A high-pass filter includes a capacitor (C) and filters a frequency component of an output from the first amplifier circuit that is no less than a predetermined value. A second amplifier circuit amplifies the output from the first amplifier circuit. A second switch stops charging/discharging of the capacitor (C) and decreases a gain of the second amplifier circuit at least while the first switch cancels the electrical connection.

Biopotential measuring apparatus

An apparatus for processing and observing a cross-section includes: a sample bed holding a sample; a focused ion beam column radiating a focused ion beam to the sample; an electron beam column radiating an electron beam to the sample, perpendicularly to the focused ion beam; an electron detector detecting secondary electrons or reflection electrons generated from the sample; a irradiation position controller controlling irradiation positions of the focused ion beam and the electron beam based on target irradiation position information showing target irradiation positions of beams on the sample; a process controller controlling a cross-section-exposing process that exposes a cross-section of the sample by radiating the focused ion beam to the sample and a cross-section image-obtaining process that obtains a cross-section image of the cross-section by radiating the electron beam to the cross-section; and an image quality corrector correcting image quality of the cross-section image obtained.

Apparatus, method, and program for processing and observing cross section, and method of measuring shape

Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.

Method of preparing thin film sample piece and charged particle beam apparatus

An automatic sample preparation apparatus that automatically prepares a sample piece from a sample includes: a focused ion beam irradiation optical system configured to irradiate a focused ion beam; an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam; a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample; a detector configured to detect secondary charged particles emitted from an irradiation object by irradiating the irradiation object with the focused ion beam and/or the electron beam; and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the transfer device.

Automatic sample preparation apparatus and automatic sample preparation method

An image processing system includes: an analysis unit configured to obtain information indicating a degree of curvature of a retina from a tomographic image of an eye to be examined; and an obtaining unit configured to obtain a category of the eye to be examined based on an analysis result.

Image processing system, processing method, and storage medium

Growing community of inventors

Tokyo, Japan

Makoto Sato