Wisconsin Alumni Research Foundation

Kokusai Electric Co., Ltd.

Sumitomo Metal Mining Company, Ltd.

Mitsui Minings & Melting Co., Ltd.

Makoto Ozawa

Yoshihiro Kawaoka

Gabriele Neumann

Kentaro Sogabe

Isao Ando

Tohru Yoshida

Kazuyuki Toyoda

Atsuhiko Suda

Fumihide Ikeda

Ryoji Saito

Mitsuhiro Hirano

Toshikazu Karino

Katsuhiro Kawakubo

Shoichiro Izumi

Satoshi Kakizaki

Fujio Makuta

Issei Makiguchi

Mikio Koizumi

The invention provides a recombinant biologically contained influenza virus that is a PB2 knockout virus, e.g., one that is useful to generate a multivalent vaccine, and methods of making and using that virus.

Influenza viruses with mutant PB2 gene segment as live attenuated vaccines

Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material () is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface () one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface () has an arithmetic mean roughness Ra of 0.9 &#x3bc;m or more, a maximum height Rz of 10.0 &#x3bc;m or less, and Rzroughness of 7.0 &#x3bc;m or less. A sputtering target () is obtained by bonding the obtained target material () to a backing body () by way of a bonding layer ().

Target material for sputtering and method for manufacturing same

Influenza viruses with mutant PB2 segment as live attenuated vaccines

The present invention provides: an oxide sintered body having superior manufacturing stability, film stability, discharge stability, and mechanical strength; a process for manufacturing the same; and an oxide film obtained by using the oxide sintered body and having an intermediate refractive index. The oxide sintered body comprising In and Si, wherein a Si content is 0.65 to 1.75 in Si/In atomic ratio, a relative density is 90% or more, and a bending strength is 90 N/mmor more, is manufactured, and the oxide film with refractive index of 1.70 to 1.90 by a sputtering process using the oxide sintered body is manufactured.

Oxide sintered body, process for manufacturing same, and oxide film

[Object] Provided are a Zn&#x2014;Sn&#x2014;O-based oxide sintered body which is used as a sputtering target or a tablet for vapor deposition and which is resistant to crack formation and the like during film formation, and a method for producing the same. [Solving means] The oxide sintered body is characterized in that tin is contained with an atomic ratio of Sn/(Zn+Sn) being 0.01 to 0.6, an average crystal particle diameter of the sintered body is 4.5 &#x3bc;m or less, and a degree of orientation represented by I/[I+I] is 0.52 or more, where Iand Irepresent integrated intensities of the (222) plane and the (400) plane of a ZnSnOphase measured by X-ray diffraction using the CuK&#x3b1; radiation. The oxide sintered body has an improved mechanical strength, so that the oxide sintered body is resistant to breakage during processing of the sintered body and also is resistant to breakage and crack formation during film formation of transparent conductive films when used as a sputtering target or a tablet for vapor deposition.

Zn&#x2014;Sn&#x2014;O based oxide sintered body and method for producing the same

The invention provides adenovirus and retrovirus vectors useful to prepare influenza virus. Also provided is a canine RNA polymerase I promoter and vectors having that promoter.

Adenoviral vectors for influenza virus production

A substrate processing apparatus comprises a substrate transfer section, connection modules attached to the substrate transfer section, and a first substrate transfer robot in the substrate transfer section capable of transferring substrates to the connection modules. The connection module comprises a substrate processing chamber, first and second intermediate chambers between the substrate processing chamber and the substrate transfer section. The second intermediate chamber is provided with a first substrate holder, the substrate processing chamber is provided with a second substrate holder, and the first intermediate chamber is provided with a substrate transfer device capable of mounting a plurality of the substrates held being stacked in the vertical direction by the first substrate holder, onto the second substrate holder such that the substrates are arranged side by side in the horizontal direction.

Substrate processing apparatus

A semiconductor manufacturing equipment, which comprises a boat elevator installed below a reaction chamber for loading a boat into the reaction chamber, cassette stocker installed opposite to the boat elevator, a wafer carrier installed between the cassette stocker and the boat elevator and used for transferring wafers between the cassette stocker and the boat, and a load-lock chamber for accommodating the boat elevator, whereby wafers are carried in the atmospheric air within the semiconductor manufacturing equipment, and the transport time is set in such manner that an increase of a natural oxide film formed on the wafers is 2 angstroms or less.

Semiconductor manufacturing equipment and method for carrying wafers in

In the semiconductor manufacturing apparatus according to the present invention, there are provided a cassette stocker for accommodating wafer cassettes loaded with wafers, a reaction furnace provided with heating means, a reaction gas introducing means for introducing reaction gas into the reaction furnace, a gas discharging means for discharging exhaust gas in the reaction furnace, a boat for supporting wafers, a buffer cassette stocker for storing unprocessed wafers, a boat elevating means for inserting the boat into and retrieving the boat from the reaction furnace, a wafer transfer means for transferring wafers between the boat and the wafer cassette accommodated on the cassette stocker, and a wafer cassette transfer means for transferring wafer cassettes between the buffer cassette stocker and the cassette stocker, and the buffer cassette stocker is enclosed to provide an antioxidation area to prevent natural oxidation of the wafers in standby status.

Growing community of inventors

Tokyo, Japan

Makoto Ozawa