Mitsubishi Chemical Corporation

Makoto Ookawa

Hiroshi Onomoto

Shinya Shakagoori

Katsumi Hara

Kazuya Takanashi

This method for producing a mold for nanoimprinting in which a minute bumpy structure has been formed at the surface of a roller-shaped aluminum substrate of which the surface has been machined has: a polishing step for mechanically polishing the surface of the roller-shaped aluminum substrate, of which the surface has been machined, at least until the average crystal grain size changes; and a minute bumpy structure formation step for anodizing the aluminum substrate after the polishing step and forming a minute bumpy structure. The anti-reflective article has a minute bumpy structure at the surface, and in the wavelength region of visible light, has a color difference (E*) to the origin represented in the L*a*b* color system and derived by means of formula (1) of no greater than 0.9, or a chroma (C*) determined by means of formula (2) of no greater than 0.7.*={(*)+(*)+(*)}&#x2003;&#x2003;(1)*={(*)+(*)}&#x2003;&#x2003;(2)

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Yokohama, Japan

Makoto Ookawa