4d-s Pty, Ltd

Applied Materials, Inc.

Nabtesco Corporation

Unity Semiconductor Corporation

Other

Global Silicon Net Corp.

Makoto Nagashima

Peter W Lee

David N Wang

Toshiaki Ogawa

Koji Itoh

Kazuto Fukuma

Darrell Rinerson

Dominik J Schmidt

Tetsuya Sato

Koji Ito

Jerry Yuen Wong

Hirofumi Ono

Hiroshi Nishizato

Steve K Hsia

Tatsuya Sato

Naoaki Kobayashi

Keigo Futamata

Larry Matheny

Steve Kuo-Ren Hisa

Provided is a test apparatus for an actuator, which can easily switch whether to establish or undo the coupling between an actuator to be tested and a load part configured to apply load to the actuator. A test apparatus for an actuator includes a load part for outputting load to be applied to an actuator to be tested, first levers for swinging around a rotational shaft in connection with an output from the load part, an idler link coupled to the output from the actuator to be tested, a second lever coupled to the idler link in a swingable manner and for swinging around a rotational shaft that is arranged coaxially with the rotational shaft of the first levers, and a clutch mechanism for coupling together the first levers and the second lever and undoing the coupling.

Test apparatus for testing an actuator

An actuator-link assembly includes an actuator having first and second opposing ends in order to drive a control surface of an aircraft and a link coupled to the actuator. The actuator has a rod portion having a tip end, located at first end of the actuator, said tip end pivotably attach to a control surface of an aircraft. The link includes a pair of linear portions, each having first and second opposing ends, wherein the linear portions are disposed alongside each other; a coupling portion connecting the first ends of linear portions, a fulcrum shaft attachment portion protruding from the coupling portion configured to pivotably attach to a fulcrum shaft for rotatably supporting the control surface; and an actuator attachment portion configured to pivotably attach to the second end of the actuator. A material constituting the linear portions and the coupling portion contains fiber reinforced plastic.

Actuator-link assembly for aircraft control surface

A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cahode.

Dual hexagonal shaped plasma source

Systems and methods are disclosed to form a resistive random access memory (RRAM) by forming a first metal electrode layer; depositing an insulator above the metal electrode layer and etching the insulator to expose one or more metal portions; depositing a PrCaMnO(PCMO) layer above the insulator and the metal portions, wherein X is between approximately 0.3 and approximately 0.5, to form one or more self-aligned RRAM cells above the first metal electrode; and depositing a second metal electrode layer above the PCMO layer.

Systems and methods for fabricating self-aligned memory cell

In a material determining step, the material constituting an actuator and the material constituting a link are determined such that at least one of the materials contains fiber reinforced plastic. In a computing step, a computation model that defines the relationship between a control surface, the actuator, and the link is used to compute the change in gain margin with the change in a rigidity ratio, which is the ratio of the rigidity of the link to the rigidity of the actuator. The rigidities of the actuator and the link are determined in a rigidity determining step based on a result of the above-described computation, the shapes of the actuator and the link are determined in a shape determining step, and the actuator and the link are formed in a formation step, and are assembled in an assembly step.

Actuator-link assembly manufacturing method, actuator-link assembly designing method, and actuator-link assembly

An aircraft reaction link includes a pair of linear portions, a coupling portion that couples ends of the pair of linear portions on the same side to each other, a fulcrum shaft attachment portion, and a cylinder attachment portion. A metal frame that is made of a metallic material and that is provided so as to extend across the coupling portion and the pair of linear portions and a composite frame that is made of fiber-reinforced plastic and that is provided so as to extend at least in the pair of linear portions are bonded together, and thereby, the pair of linear portions and the coupling portion are formed. The metal frame is provided so as to extend from the fulcrum shaft attachment portion to the cylinder attachment portion.

Aircraft reaction link

A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cathode.

Systems and methods are disclosed for face target sputtering to fabricate semiconductors by providing one or more materials with differential coefficients of expansion in the FTS chamber; and generating a controlled pressure and size with the one or more materials during sintering.

Systems and methods for magnetron deposition

Systems and methods are disclosed for processing a semiconductor substrate by depositing a conductive layer on the substrate; patterning a set of insulating structures on the substrate; selectively back-biasing the substrate; depositing a layer of material on the substrate; and removing a part of the conductive layer selectively biased to attract cation bombardment.

Systems and methods for plasma etching

A method is disclosed to effectively achieve a low deposition temperature of CMO memory materials by depositing the CMO memory material at relatively low temperatures that give an amorphous film, then to later melt and re-crystallize the CMO memory material with a laser (laser annealing).

Laser annealing of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits

A memory fabrication apparatus includes a pair of targets arranged so as to be spaced apart from one another within a closed vacuum vessel, each target of said pair of targets having a sputtering surface facing the sputtering surface of the other target of said pair of targets; and substrate holder adapted to receive facing target sputtering a CMO material on an electrode.

Low temperature deposition of complex metal oxides (CMO) memory materials for non-volatile memory integrated circuits

A facing targets sputtering device for semiconductor fabrication includes an air-tight chamber in which an inert gas is admittable and exhaustible; a pair of target plates placed at opposite ends of said air-tight chamber respectively so as to face each other and form a plasma region therebetween; a pair of magnets respectively disposed adjacent to said target plates such that magnet poles of different polarities face each other across said plasma region thereby to establish a magnetic field of said plasma region between said target plates; a substrate holder disposed adjacent to said plasma region, said substrate holder adapted to hold a substrate on which an alloyed thin film is to be deposited; and a back-bias power supply coupled to the substrate holder.

Growing community of inventors

Tokyo, Japan

Makoto Nagashima