Hamamatsu-photonics K.k.

Other

Chisso Corporation

Iinuma Gauge Mfg. Co., Ltd

Makoto Kono

Shizuo Murata

Satoshi Tanioka

Masayuki Hirano

Tetsuya Taka

Keiichi Ota

Ryo Takiguchi

A solid-state imaging device according to the disclosure includes a semiconductor substrate which has a main surface having a plurality of photosensitive regions, and an insulating film which is provided on the main surface of the semiconductor substrate. When the main surface of the semiconductor substrate is taken as a reference surface, a thickness of the insulating film from the reference surface is 0.5 μm or more, a surface (a main surface) of the insulating film on the side opposite to the main surface is a surface having flatness, and a plurality of types of bottom surfaces of which depths from the reference surface are different from each other are provided on the main surface of the semiconductor substrate in the photosensitive regions.

Solid-state imaging device

A spectroscopic measurement device emits light to a measurement target and measures the measurement light output from the measurement target in accordance with the light emission. A spectroscopic measurement device includes: a first housing having a light shielding property and configured to house a light source that emits light and having a first opening through which the light emitted from the light source passes; a second housing having a light shielding property and having a second opening through which the measurement light passes and configured to house a spectrometer that receives the measurement light that has passed through the second opening; and an arm member configured to relatively rotatably join the first housing and the second housing. A proximal end side of the arm member is rotatably joined with the second housing. The first housing is attached to a distal end side of the arm member.

Spectroscopic measurement device and spectrometry system

A spectroscopic measurement device emits light to a measurement target and measures the measurement light output from the measurement target in accordance with the light emission. A spectroscopic measurement device includes: a first housing having a light shielding property and configured to house a light source that emits light and having a first opening through which the light emitted from the light source passes; a second housing having a light shielding property and having a second opening through which the measurement light passes and configured to house a spectrometer that receives the measurement light that has passed through the second opening; and an attachment configured to detachably hold the first housing and the second housing.

A spectroscopic measurement device emits light to a measurement target and measures the measurement light output from the measurement target in accordance with the light emission. A spectroscopic measurement device includes: a first housing having a light shielding property and configured to house a light source that emits light and having a first opening through which the light emitted from the light source passes; a second housing having a light shielding property and having a second opening through which the measurement light passes and configured to house a spectrometer that receives the measurement light that has passed through the second opening; and a junction configured to join the first housing and the second housing such that relative positions of the first housing and the second housing can be changed.

Disclosed is a method for producing liquid crystal display devices comprising a step for forming a transparent electrode and a circuit element of semiconductor on the surface of a pair of transparent substrates, and various steps for applying a photoresist, exposing to the light, etching, releasing the photoresist, inspecting the electrodes and circuit elements of semiconductor, forming an insulating film, forming an alignment film, rubbing the alignment film, spreading spacers, applying a sealing agent, fabricating a cell, filling a liquid crystal, pasting a polarizing plate, and connecting a driver IC characterized in that a soft X-ray is irradiated to the substrate in at least one step prior to the rubbing of the alignment films to produce liquid crystal display devices, at a high yield, in which devices number of pixel defect is small.

Method for producing liquid crystal display device

Thin film coater and coating method

A method for treating an aligning film for a liquid crystal display element and a method for preparing a liquid crystal display element are proposed. The said treating method comprises rubbing a specified aligning film formed on a transparent substrate with a transparent electrode and thereafter radiating soft X-ray for 2 seconds or more in gas. The said preparing method comprises arranging a transparent electrode on a pair of transparent substrates, forming an aligning film consisting of an organic high molecular compound on the said transparent electrode, treating the said aligning film by a rubbing treatment, assembling the substrates face to face each other via a spacer, and then sealing a liquid crystal material. By a method for treating an aligning film according to the invention, it is possible to lower display unevenness of a liquid crystal display element and to improve an yield of product.

Method for treating an aligning film for a liquid crystal display

A method for treating an aligning film for a liquid crystal display element wherein an aligning film consisting of an organic high molecular compound formed on a transparent substrate with a transarent electrode is subjected to a robbing treatment and thereafter said aligning film is irradiated with soft X-rays in a gas. A method for preparing a liquid crystal display element comprising the steps of arranging a transparent electrode on a pair of transparent substrates, forming an aligning film consisting of an organic high molecular compound on the said transparent electrode, treating said aligning film by a rubbing treatment, assembling the substrates to face each other with a spacer disposed therebetween, and then applying and sealing to a substrate a liquid crystal material wherein the aligning film is subjected to a robbing treatment and thereafter said aligning film is irradiated with soft X-rays in gas.

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Hamamatsu, Japan

Makoto Kono