Hitachi, Ltd.

Makoto Kitoo

Yoshinori Honda

Yuuichi Kokaku

A protective film having a very low coefficient of friction, a good wear resistance, a good adhesion, and prolonged lubricating and moisture-resistant properties is formed on a substrate by sputtering of a target consisting of at least one of organic polymers and at least one of boron compounds.

Process for forming protective film of organic polymer and boron

Fine resist patterns having high sensitivity and steeply improved residual film ratio is obtained by forming a multilayer film consisting of organic substances on a substrate, making at least one layer other than the lowest layer of said multilayer film contain metal elements, irradiating said multilayer film with light or radiations, and developing with plasma.

Method for forming fine multilayer resist patterns

A magnetic recording medium produced by forming an organic protective layer on a magnetic recording layer by sputtering conducted in an inert gas atmosphere using a material for forming the organic protective layer as cathode and the magnetic recording layer as anode has excellent lubricating properties and wear resistance.

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Yokohama, Japan

Makoto Kitoo