Fuji Photo Film Company, Limited

Fujifilm Corporation

Fuji Photo Film, Inc.

Makoto Kashiwaya

Junji Nakada

Junichi Yoneda

Taihei Noshita

Yasuo Iwabuchi

Yuichi Hosoi

Kunihiko Sano

Atsunori Takasu

Takashi Kataoka

Hiroshi Sohda

Junji Nakata

Yukinori Nakamura

There is provided a vacuum film deposition apparatus which forms a film on a substrate by a vacuum film deposition technique, include: substrate holding means for holding the substrate; a deposition preventing member for preventing film deposition at undesired positions within the apparatus; and contacting means for bringing the substrate or the substrate holding means and the deposition preventing member into contact with each other.

Vacuum film deposition apparatus

The process and apparatus introduce a carrier gas into a vacuum evaporation chamber, evaporate a film forming material from a evaporation source and deposit the evaporated film forming material on a substrate in sheet form to form a stimulable phosphor layer, thereby producing a evaporated phosphor sheet having a stimulable phosphor layer formed on the substrate. The stimulable phosphor layer is formed with substantially all areas of the evaporation source except opening for evaporation being masked to block movement of heat toward the substrate. The evaporated phosphor sheet includes the substrate and a CsBr:Eu evaporated stimulable phosphor layer deposited on the substrate. A maximum intensity of instantaneous light emission from the stimulable phosphor layer at 640 nm upon excitation by uv radiation is lower than a maximum intensity of the instantaneous light emission at 440 nm.

Process and apparatus for producing evaporated phosphor sheets and an evaporated phosphor sheet produced by means of such process and apparatus

A phosphor layer of a radiation image storage panel produced by vapor phase deposition method under such condition that the phosphor layer is composed of a phosphor of a cesium chloride crystalline structure which is grown on a crystal face of () or () shows an increased sensitivity.

Radiation image storage panel

A radiation image storage panel having a phosphor layer which is composed of a phosphor having a matrix component and an activator component is prepared by the steps of forming on a substrate a lower prismatic crystalline layer composed of the matrix component by vapor deposition; and forming on the lower prismatic crystalline layer an upper prismatic crystalline layer composed of the matrix component and the activator component by vapor deposition.

Preparation of radiation image storage panel

The carbon layer forming method starts a film deposition process of a carbon layer by vapor phase deposition after a content of particles having a particle size of 0.5 &mgr;m or more is adjusted in a film deposition system of the carbon layer to 1000 particles/ft /min or less. The carbon layer forming method by means of a vapor phase deposition technique such as sputtering or CVD ensures that a high-quality carbon layer having significantly reduced pinholes or cracks can be obtained. Since the carbon protective layer obtained by this method has no cracking and delamination due to pinholes and cracks, the thermal head having the carbon protective layer has a sufficient durability to ensure that high reliability is exhibited over an extended period of time to perform thermal recording of high-quality images consistently over an extended period of operation.

Carbon layer forming method

A thermal head lapping apparatus includes a pallet for holding at least one thermal head, a transport device for transporting the thermal head held on the pallet successively to a specified processing position, and a lapping device for forcing a lapping material being moved onto the thermal head that has been transported to said processing position. As a result, the apparatus is capable of advantageously performing lapping treatment with a good efficiency on surfaces to be coated with protective layers or the formed protective layers in a process of fabricating a thermal head, thereby improving the production efficiency of the thermal head and fabricating with a good productivity the suitably lapped thermal head of high quality that ensures high quality image recording.

Thermal head lapping apparatus

A thermal head fabricating method forms a lower protective layer made of ceramics for protecting a plurality of heat-generating resistors and electrodes, subjects the lower protective layer to etching processing by a plasma and forms a carbon protective layer on the thus subjected lower protective layer. The etching processing is performed using a mask which defines an area where the carbon protective layer is formed, a protective layer is formed on a surface of the mask, and the protective layer is made of a material which is etched at an extremely slow rate or substantially not etched compared with ceramics composing the lower protective layer and/or which does not impart an adverse effect to the carbon protective layer that is subsequently formed.

Method of fabricating thermal head

The invention provides an improved thermal head having a protective film of a heater which comprises a carbon-based protective layer having a hardness difference in its thickness direction. The invention also provides an improved method of manufacturing the thermal head. A thermal head is thus obtained having a protective layer which is significantly protected from corrosion and wear, also from cracks and peeling-off due to heat and mechanical impact, and which allows the thermal head to have a sufficient durability to exhibit a high reliability over an extended period of time, thereby ensuring that the thermal recording of high-quality images is performed consistently over an extended period of operation.

Thermal head and method of manufacturing the same

The method of forming a carbon layer by vapor phase deposition starts a film deposition process of the carbon layer after a surface to be coated with the carbon layer is heated while adjusting a partial pressure of moisture in a film deposition system of the carbon layer to 5&times;10,Torr or less. This carbon layer forming method by means of a vapor phase deposition technique such as sputtering ensures that a high-quality carbon layer having high adhesion to the lower layer and significantly reduced pinholes or cracks is obtained.

The thermal head fabrication method provides a thermal head having a lower protective layer composed of at least one sub-layer on heat generators and electrodes, an intermediate protective layer composed of at least one sub-layer on the lower protective layer and an upper protective layer composed of at least one sub-layer with carbon as a main component on the intermediate protective layer. At least one of surfaces of the lower and intermediate protective layers is cleaned by ion irradiation processing, by polishing with a lapping tape or an adhesive tape, or by heating processing in vacuum before forming a higher protective layer. This allows the thermal head to have excellent adhesion between any individual layers and sufficient durability to ensure that the thermal recording of high-quality images is consistently performed over an extended period of time.

Thermal head fabrication method

The improved thermal head of the invention is the one having a protective film of a heater formed on the heater, the protective film comprising a ceramic-based lower protective layer composed of at least one sub-layer and a carbon-based upper protective layer formed on the lower protective layer, wherein a surface of the lower protective layer on which the upper protective layer is to be formed has a surface roughness value Ra of 0.005 to 0.5 &mgr;m; or the one in which the depth of a depression step which may be formed on the surface of the lower protective layer due to the thickness of the electrodes used for supplying power to the heater (or heat-generating resistor) was reduced to 0.2 &mgr;m or less. Therefore, the thermal head of the invention has a protective film which has significantly reduced corrosion and wear, which is advantageously protected from cracks and peeling-off due to heat and mechanical impact and which allows the thermal head to have a sufficient durability to exhibit high reliability over an extended period of time, thereby ensuring that the thermal recording of high-quality images is consistently performed over an extended period of operation.

The improved thermal head has a protective film of a heater formed on the heater, the protective film comprising a ceramic-based lower protective layer composed of at least one sub-layer, an intermediate protective layer also composed of at least one sub-layer and formed on the lower protective layer, and a carbon-based upper protective layer formed on the intermediate protective layer. The thermal head of the invention has a protective film which has significantly reduced corrosion and wear, which is advantageously protected from cracking and peeling due to heat and mechanical impact and which allows the thermal head to have a sufficient durability to ensure that the thermal recording of high-quality images is consistently performed over an extended period of operation.

Thermal head

The thermal head having a protective film of a heating element, the protective film comprising at least one protective layer including a carbon-based carbon protective layer, wherein an oxygen amount in an interface between the carbon protective layer and a lower layer formed under the carbon protective layer is not more than 20 atm %. The thermal head includes a protective film which has significantly reduced corrosion and wear, which is free from cracking and peeling due to heat and mechanical impact and which allows the thermal head to have sufficient durability to ensure that the thermal recording of high-quality images is consistently performed over an extended period of time. Even for an application in which recording under high-energy and high-pressure conditions is performed on a thermal film using a high rigid substrate to be employed in the medical use and the like, the thermal head also has sufficient durability to exhibit high reliability over an extended period of time.

The improved thermal recording system uses both a thermal head having a layer to protect heaters and a thermal recording material in which a thermal recording layer unit has a water content of no more than 6 wt. %, the protective layer of the thermal head comprising at least one ceramic-based lower sub-layer which is overlaid with a carbon-based upper sub-layer. This thermal recording system improves the wear resistance and electrical insulation of the protective layer on the thermal head so markedly that high operational reliability is insured for an extended period of time.

Thermal recording system including thermal head and thermal recording

The improved thermal head of the invention is the one having a protective film of a heater formed on the heater, the protective film comprising a ceramic-based lower protective layer composed of at least one sub-layer and a carbon-based upper protective layer formed on the lower protective layer, wherein a surface of the lower protective layer on which the upper protective layer is to be formed has a surface roughness value Ra of 0.005 to 0.5 .mu.m; or the one in which the depth of a depression step which may be formed on the surface of the lower protective layer due to the thickness of the electrodes used for supplying power to the heater (or heat-generating resistor) was reduced to 0.2 .mu.m or less. Therefore, the thermal head of the invention has a protective film which has significantly reduced corrosion and wear, which is advantageously protected from cracks and peeling-off due to heat and mechanical impact and which allows the thermal head to have a sufficient durability to exhibit high reliability over an extended period of time, thereby ensuring that the thermal recording of high-quality images is consistently performed over an extended period of operation.

Growing community of inventors

Kanagawa, Japan

Makoto Kashiwaya